Plasma processing is a plasma-based material processing technology that aims at modifying the chemical and physical properties of a surface.
Plasma processing techniques include:
Plasma activation
Plasma ashing
Plasma cleaning
Plasma electrolytic oxidation
Plasma etching
Plasma functionalization
Plasma polymerization
Corona treatment
Plasma modification
Related topics are plasma chemistry, chemical vapor deposition, and physical vapor deposition processes like sputter deposition, plasma iondoping, vacuum plasmaspraying, and reactive ion etching.
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Plasma () is one of four fundamental states of matter, characterized by the presence of a significant portion of charged particles in any combination of ions or electrons. It is the most abundant form of ordinary matter in the universe, being mostly associated with stars, including the Sun. Extending to the rarefied intracluster medium and possibly to intergalactic regions, plasma can be artificially generated by heating a neutral gas or subjecting it to a strong electromagnetic field.
The students will learn about the essential chemical, thermodynamic and physical mechanisms governing thin film growth, about the most important process techniques and their typical features, includin