Publications related to Extreme ultraviolet lithography

Unified rule based correction for corners in proximity lithography mask using high resolution features

Hans Peter Herzig, Toralf Scharf, Krishnaparvathy Puthankovilakam

Printing industry and printing techniques are increasing its market value by new methodologies. The resolution and accuracy of the pattern transfer is always a challenge for the industry, especially for the proximity printing industries which use mask alig ...

Elsevier2017

High-aspect ratio nanopatterning via combined thermal scanning probe lithography and dry etching

Jürgen Brugger, Yuliya Lisunova

Thermal scanning probe lithography is an emerging nanofabrication technique for rapid prototyping of arbitrary topographies in thermally sensitive resist. This feature, paired to the recent advances in dry plasma etching techniques, allows the fabrication ...

Elsevier2017

Multimaterial Nanoporous Membranes Shaped through High Aspect-Ratio Sacrificial Silicon Nanostructures

Philippe Renaud, Arnaud Bertsch, Niccolo Piacentini, Stefano Silvio Giovanni Varricchio

We present an innovative fabrication method for solid-state nanoporous membranes based on the casting of sacrificial silicon nanostructures. The process allows the individual definition of geometry and placement of each nanopore through e-beam lithography ...

Amer Chemical Soc2017

A reproducible method for μm precision alignment of PDMS microchannels with on-chip electrodes using a mask aligner

Philippe Renaud, Jonathan Bastien Cottet

This paper describes a reproducible method for μm precision alignment of polydimethylsiloxane (PDMS) microchannels with coplanar electrodes using a conventional mask aligner for lab-on-a-chip applications. It is based on the use of a silicon mold in combin ...

American Institute of Physics2017

A Monolithic Approach to Downscaling Silicon Piezoresistive Sensors

Yusuf Leblebici, Mohammad Nasr Esfahani

Multi-scale integration remains the primary challenge in the fabrication of miniature piezoresistive sensors, as the co-fabrication of a silicon nanowire along with a microscale shuttle is the main architecture facilitating high-sensitivity transduction. T ...

Institute of Electrical and Electronics Engineers2017

Compact Lensless Phase Imager

Michaël Unser, Ferréol Arnaud Marie Soulez

Lensless quantitative phase imaging is of high interest for obtaining a large field of view (FOV), typically the size of the camera chip, to observe biological cell material with high contrast. It has the potential to be widely spread due to its inherent s ...

2017

Control of the interaction strength of photonic molecules by nanometer precise 3D fabrication

Jürgen Brugger, Yuliya Lisunova

Applications for high resolution 3D profiles, so-called grayscale lithography, exist in diverse fields such as optics, nanofluidics and tribology. All of them require the fabrication of patterns with reliable absolute patterning depth independent of the su ...

Nature Publishing Group2017

Identification of Semiconductor Defects through Constant-Fermi-Level Ab Initio Molecular Dynamics: Application to GaAs

Alfredo Pasquarello, Assil Bouzid

We show that constant-Fermi-level ab initio molecular dynamics can be used as a computer-based tool to reveal and control relevant defects in semiconductor materials. In this scheme, the Fermi level can be set at any position within the band gap during the ...

Amer Physical Soc2017

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Extreme ultraviolet lithography

Unified rule based correction for corners in proximity lithography mask using high resolution features

High-aspect ratio nanopatterning via combined thermal scanning probe lithography and dry etching

Multimaterial Nanoporous Membranes Shaped through High Aspect-Ratio Sacrificial Silicon Nanostructures

Novel manufacturing methods for optical antennas

A reproducible method for μm precision alignment of PDMS microchannels with on-chip electrodes using a mask aligner

A Monolithic Approach to Downscaling Silicon Piezoresistive Sensors

Compact Lensless Phase Imager

Control of the interaction strength of photonic molecules by nanometer precise 3D fabrication

Fabrication of 2D Material Based NEMS Resonators

Identification of Semiconductor Defects through Constant-Fermi-Level Ab Initio Molecular Dynamics: Application to GaAs

Graph Chatbot

Chat with Graph Search

High-aspect ratio nanopatterning via combined thermal scanning probe lithography and dry etching

A reproducible method for μm precision alignment of PDMS microchannels with on-chip electrodes using a mask aligner

Multimaterial Nanoporous Membranes Shaped through High Aspect-Ratio Sacrificial Silicon Nanostructures

A Monolithic Approach to Downscaling Silicon Piezoresistive Sensors

Compact Lensless Phase Imager

Unified rule based correction for corners in proximity lithography mask using high resolution features

Control of the interaction strength of photonic molecules by nanometer precise 3D fabrication

Fabrication of 2D Material Based NEMS Resonators

Identification of Semiconductor Defects through Constant-Fermi-Level Ab Initio Molecular Dynamics: Application to GaAs

Novel manufacturing methods for optical antennas