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Andreas Vetter

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Andreas Vetter

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High-resolution interference microscopy with spectral resolution for the characterization of individual particles and self-assembled meta-atoms

Computational rule-based approach for corner correction of non-Manhattan geometries in mask aligner photolithography

Inverse photonic design of functional elements that focus Bloch surface waves

Computational rule-based approach for corner correction of non-Manhattan geometries in mask aligner photolithography

High-resolution interference microscopy with spectral resolution for the characterization of individual particles and self-assembled meta-atoms

Inverse photonic design of functional elements that focus Bloch surface waves