Publication

Effect of a halogen-based precursor on dopant incorporation in 3C-SiC film epitaxy

Marco Negri
2017
Journal paper
Abstract

Silicon carbide thin films were synthesised by vapour phase epitaxy technique on silicon substrates using silane and propane as precursors. Methyltrichlorosilane (MTS) was added, and nitrogen was used as dopant precursor. Samples with different doping concentrations were obtained varying the nitrogen flow during the growth. Doping level for each sample was assessed using Raman technique, and a correlation between dopant flow and doping level was confirmed. The influence of MTS on nitrogen incorporation is analysed and discussed: the introduction of MTS increases the growth rate and increases the doping level. We exclude a direct doping effect by the MTS, but we think that it promotes the incorporation of nitrogen doping species. The crystalline quality of the as-grown films was evaluated using X-ray diffraction, assessing the good crystalline quality even in samples obtained using high growth rates and high doping level.

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Doping (semiconductor)
In semiconductor production, doping is the intentional introduction of impurities into an intrinsic semiconductor for the purpose of modulating its electrical, optical and structural properties. The doped material is referred to as an extrinsic semiconductor. Small numbers of dopant atoms can change the ability of a semiconductor to conduct electricity. When on the order of one dopant atom is added per 100 million atoms, the doping is said to be low or light.
Crystalline silicon
Crystalline silicon or (c-Si) Is the crystalline forms of silicon, either polycrystalline silicon (poly-Si, consisting of small crystals), or monocrystalline silicon (mono-Si, a continuous crystal). Crystalline silicon is the dominant semiconducting material used in photovoltaic technology for the production of solar cells. These cells are assembled into solar panels as part of a photovoltaic system to generate solar power from sunlight. In electronics, crystalline silicon is typically the monocrystalline form of silicon, and is used for producing microchips.
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