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The invention concerns a single-particle inductively-coupled plasma (ICP) mass spectrometry particle sizing and counting method comprising providing or receiving an intensity-versus-counts histogram of particles detected using an ICP mass spectrometer, the intensity representing particle detection and the count representing particle detection frequency; providing or receiving mass flux calibration data or calibration curve data relating a value of the intensity measurement or data of the ICP mass spectrometer to a mass of material detected per acquisition interval or dwell time; determining a particle mass of the particles detected using the mass flux calibration data or the at least one mass flux calibration curve data, determining a particle volume of the detected particles using the determined particle mass, and determining a particle size of the particles detected using the determined particle volume of the particles detected and a determined or attributed geometry or shape of the detected particles.
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Jian Wang, Matthias Finger, Qian Wang, Yiming Li, Matthias Wolf, Varun Sharma, Yi Zhang, Konstantin Androsov, Jan Steggemann, Leonardo Cristella, Xin Chen, Davide Di Croce, Arvind Shah, Rakesh Chawla, Anna Mascellani, João Miguel das Neves Duarte, Tagir Aushev, Lei Zhang, Tian Cheng, Yixing Chen, Werner Lustermann, Andromachi Tsirou, Alexis Kalogeropoulos, Andrea Rizzi, Ioannis Papadopoulos, Paolo Ronchese, Hua Zhang, Siyuan Wang, Jessica Prisciandaro, Tao Huang, David Vannerom, Michele Bianco, Sebastiana Gianì, Sun Hee Kim, Kun Shi, Wei Shi, Guido Andreassi, Abhisek Datta, Jian Zhao, Federica Legger, Gabriele Grosso, Ji Hyun Kim, Donghyun Kim, Zheng Wang, Sanjeev Kumar, Wei Li, Yong Yang, Geng Chen, Ajay Kumar, Ashish Sharma, Georgios Anagnostou, Joao Varela, Csaba Hajdu, Muhammad Ahmad, Ekaterina Kuznetsova, Ioannis Evangelou, Matthias Weber, Muhammad Shoaib, Milos Dordevic, Meng Xiao, Sourav Sen, Xiao Wang, Kai Yi, Jing Li, Rajat Gupta, Zhen Liu, Muhammad Waqas, Hui Wang, Seungkyu Ha, Maren Tabea Meinhard, Long Wang, Miao Hu, Anton Petrov, Xin Sun, Xin Gao, Chen Chen, Valérie Scheurer, Giovanni Mocellin, Muhammad Ansar Iqbal, Lukas Layer