Concept
Lithography
Related people (11)
Jürgen Brugger
I am a Professor of Microengineering and co-affiliated to Materials Science. Before joining EPFL I was at the MESA Research Institute of Nanotechnology at the University of Twente in the Netherlands, at the IBM Zurich Research Laboratory, and at the Hitachi Central Research Laboratory, in Tokyo, Japan. I received a Master in Physical-Electronics and a PhD degree from Neuchâtel University, Switzerland. Research in my laboratory focuses on various aspects of MEMS and Nanotechnology. My group contributes to the field at the fundamental level as well as in technological development, as demonstrated by the start-ups that spun off from the lab. In our research, key competences are in micro/nanofabrication, additive micro-manufacturing, new materials for MEMS, increasingly for wearable and biomedical applications. Together with my students and colleagues we published over 200 peer-refereed papers and I had the pleasure to supervise over 25 PhD students. Former students and postdocs have been successful in receiving awards and starting their own scientific careers. I am honoured for the appointment in 2016 as Fellow of the IEEE “For contributions to micro and nano manufacturing technology”. In 2017 my lab was awarded an ERC AdvG in the field of advanced micro-manufacturing.
Hans Peter Herzig
Dr. Hans Peter Herzig is Professor at the Ecole Polytechnique Fédérale de Lausanne (EPFL) and Past President of the European Optical Society (EOS). His current research interests include refractive and diffractive micro-optics, nano-scale optics and optical MEMS.
Hans Peter Herzig received his diploma in physics from the Swiss Federal Institute of Technology in Zürich, Switzerland, in 1978. From 1978 to 1982 he was a scientist with the Optics Development Department of Kern in Aarau, Switzerland, working in lens design and optical testing. In 1983, he became a graduate research assistant with the Applied Optics Group at the Institute of Microtechnology of the University of Neuchâtel, Switzerland, working in the field of holographic optical elements. In 1987, he received his PhD degree in optics. From 1989 to 2001 he was head of the micro-optics research group in Neuchâtel. From 2002 to 2008 he was a full professor and head of the Applied Optics Laboratory at the University of Neuchâtel. Professor Herzig joined the faculty at EPFL in January 2009.
He is member of OSA, IEEE Photonics Society and Fellow of EOS. 2009-2010 he was President of the European Optical Society (EOS), 2001-2009 Vice-President of the Swiss Society of Optics and Microscopy and 2012-2014 Vice-President of ICO. Dr. Herzig is in the editorial board of different scientific journals (JM3, Optical Review, JEOS). He served as Conference Chairman for international conferences of EOS, IEE, IEEE/LEOS, OSA and SPIE; and as Guest Editor of three special issues of IEEE, OSA journals. He is editor of a well-known book on micro-optics (published in English and Chinese), author of 14 book chapters, over 150 peer reviewed articles and 300 conference proceedings.
Olivier Martin
Olivier J.F. Martin received the M.Sc. and Ph.D. degrees in physics in 1989 and 1994, respectively, from the Swiss Federal Institute of Technology, Lausanne (EPFL), Switzerland. In 1989, he joined IBM Zurich Research Laboratory, where he investigated thermal and optical properties of semiconductor laser diodes. Between 1994 and 1997 he was a research staff member at the Swiss Federal Institute of Technology, Zurich (ETHZ). In 1997 he received a Lecturer fellowship from the Swiss National Science Foundation (SNSF). During the period 1996-1999, he spent a year and a half in the U.S.A., as invited scientist at the University of California in San Diego (UCSD). In 2001 he received a Professorship grant from the SNSF and became Professor of Nano-Optics at the ETHZ. In 2003, he was appointed Professor of Nanophotonics and Optical Signal Processing at the Swiss Federal Institute of Technology, Lausanne (EPFL), where he is currently head of the Nanophotonics and Metrology Laboratory and Director of the Microengineering Section.
Roger Hersch
Roger D. Hersch is professor of Computer Science and head of the Peripheral Systems Laboratory at EPFL. He received his engineering degree from ETHZ in 1975, worked in industry from 1975 to 1980, and obtained his PhD degree from EPFL in 1985. He directed the widely known
Visible Human Web Server project
, which offers a number of services for the visualization of human anatomy.
His current research focuses on color reproduction, spectral color prediction models, moiré imaging, and visual document security. Recent achievements include the PhotoProtect technology, which incorporates text as chromatic differences in order to protect identity photographs (Swiss driving license), microstructure imaging, which is used by railways companies (SNCF, RENFE) and festival organizers (Paleo) to print tickets at home and the band moire imaging technology for the protection of security documents.
Luis Guillermo Villanueva Torrijo
Guillermo Villanueva is a Tenure Track Assistant Professor at the Ecole Polytechnique Federale de Lausane (EPFL), Switzerland, in the Mechanical Engineering Institute (IGM). Before joining EPFL he was a Marie Curie post-doctoral scholar at DTU (Denmark) and Caltech (California, US); and before a post-doc at EPFL-LMIS1. He received his M.Sc. in Physics in Zaragoza (Spain) and his PhD from the UAB in Barcelona (Spain).
Since the start of his PhD (2002), Prof. Villanueva has been active in the fields of NEMS/MEMS for sensing, having expertise from the design and fabrication to the characterization and applicability. He has co-authored more than 75 papers in peer-reviewed journals (h-index of 24 WoK, 32 GoS) and more than 100 contributions to international conferences.
He is serving, or has served, on the program committees of IEEE-NEMS, IEEE-Sensors, MNE, IEEE-FCS and Transducers. He is editor of Microelectronic Engineering. He has co-organized MNE2014 and SNC2015; and he is currently co-organizing the short courses at Transducers 2019 and the 16th International Workshop on Nanomechanical Sensors (NMC2019).