Concept

Dip-pen nanolithography

Related publications (101)

Rational design and optimization of plasmonic nanoarrays for surface enhanced infrared spectroscopy

We present an approach for rational design and optimization of plasmonic arrays for ultrasensitive surface enhanced infrared absorption (SEIRA) spectroscopy of specific protein analytes. Motivated by our previous work that demonstrated sub-attomole detecti ...

2012

Directly fabricated multi-scale microlens arrays on a hydrophobic flat surface by a simple ink-jet printing technique

Jürgen Brugger, Joo Yeon Kim

A shape-tunable approach is demonstrated for the fabrication of multi-scale polymer microlenses ([small mu ]-lenses) and microlens arrays (MLAs) using an ink-jet printing (IJP) technique. Also, the influence of the surface wetting conditions on the geometr ...

Royal Society of Chemistry2012

Nanoporous SiN membranes patterned by wafer-scale nanosphere lithography

Jürgen Brugger, Andreea Veronica Savu, Oscar Vazquez Mena, Harry Heinzelmann, Mona Julia Katharina Klein, Raphaël Pugin, Franck Montagne

Nanoporous SiN membranes are interesting for a number of applications, e.g. stenciling, filtration, or tissue engineering [1-3]. The patterning of the pores requires a high resolution lithographic tool. Focused ion beam milling or e-beam lithography fulfil ...

2010

Biomolecule Patterning on Analytical Devices: A Microfabrication-Compatible Approach

Guillaume Suarez

The present work describes a methodology for patterning biomolecules on silicon-based analytical devices that reconciles 3-D biological functionalization with standard resist lift-off techniques. Unlike classic sol gel approaches in which the biomolecule o ...

2010

Electron-beam induced photoresist shrinkage influence on 2D profiles

Vasiliki Tileli

For many years, lithographic resolution has been the main obstacle in keeping the pace of transistor densification to meet Moore's Law. For the 32 nm node and beyond, new lithography techniques will be used, including immersion ArF (iArF) lithography and e ...

International Society for Optics and Photonics2010

Microchannel deformations due to solvent-induced PDMS swelling

François Gallaire

The compatibility of polydimethylsiloxane (PDMS) channels with certain solvents is a well known problem of soft lithography techniques, in particular when it leads to the swelling of the PDMS blocks. However, little is known about the modification of micro ...

Royal Society of Chemistry2010

Implementation and characterization of a quartz tuning fork based probe consisted of discrete resonators for dynamic mode atomic force microscopy

Nico de Rooij, Terunobu Akiyama

The quartz tuning fork based probe {e.g., Akiyama et al. [Appl. Surf. Sci. 210, 18 (2003)]}, termed "A-Probe," is a self-sensing and self-actuating (exciting) probe for dynamic mode atomic force microscope (AFM) operation. It is an oscillatory force sensor ...

American Institute of Physics2010

NANO-IMPRINT TECHNIQUE FOR BACK REFLECTOR IN HIGH EFFICIENCY N-I-P THIN FILM SILICON SOLAR CELLS

Christophe Ballif, Franz-Josef Haug, Jordi Escarre Palou, Karin Söderström, Rémi Biron

In this contribution, the replication of nano-textures enhancing the short circuit current of thin film silicon solar cells onto low cost substrates (glass or PolyEthylene Naphtalate (PEN)) is studied. Optical and morphological analysis is performed to ass ...

2010

Method for deposition of a sensor on a conductive substrate

Gaëtan Marti, Cédric Rey

The process comprises the step of deposition of a sensor and of a part or of the entirety of a treatment unit on a not necessarily planar conductive surface by a soft lithography technique. ...

2008

Development of novel SU-8 based nanoimprint lithography

Shenqi Xie, Rong Yang

We present two kinds of novel nanoimprint lithography techniques based on SU-8 photoresist with single layer and tri-layer approaches. The imprint templates with high aspect ratio were first fabricated by electron beam lithography (EBL) and reactive ion et ...

2008

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