Concept

Stepper

Related publications (77)

DUV/MEMS based stencils for full-wafer scale, resistless, patterning of mesoscopic structures

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

Photoresist-based lithography has major limitations if applied to MEMS with mechanically fragile and chemically functionalized surfaces. As remedy, new alternative and complementary nanopatterning methods have been developed, such as thermo-mechanical inde ...

2004

Full-wafer stencils fabricated by a DUV/MEMS process for high-throughput patterning of mesoscopic structures

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

Photoresist-based lithography has major limitations when applied to micro-electro-mechanical systems (MEMS) with mechanically fragile and/or chemically functionalised surfaces. As a remedy, alternative, complementary nanopatterning methods have been develo ...

2004

Mechanical Slit Mask Mechanism for the James Webb Space Telescope Spectrometer

Simon Nessim Henein, Philippe Schwab

A mechanical slit mask mechanism has been designed for the Near Infrared Spectrograph of the James Webb Space Telescope. This mechanism was successfully tested at a cryogenic temperature of 30K, in vacuum. The reconfigurable mask allows to form 24 optical ...

SPIE Society of Photo-Optical Instrumentation Engineers2004

Resistless Fabrication and Characterisation of Metal Nanolevers Arrays

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

The use of shadow masks (stencils) for nanopatterning overcomes the limitations typically present by patterning methods involving conventional optical lithography and etching, such as diffraction limit and etch selectivity. Nanostencils allow for resistles ...

2004

Mechanical Slit Mask Mechanism for the James Webb Space Telescope Spectrometer

Simon Nessim Henein, Philippe Schwab

This paper presents the mechanical slit mask designed for the Near Infrared Spectrograph of the James Webb Space Telescope. This mechanism is designed to function at a cryogenic temperature of 30K, in vacuum. The reconfigurable mask allows to form 24 optic ...

ESA Publications Division2003

All-photoplastic microstencil with self-alignment for multiple layer shadow-mask patterning

Jürgen Brugger

A rapid and simple method to fabricate tiny shadow-masks and their use in multi-layer surface patterning with in situ micromechanical alignment is presented. Instead of using silicon micromachining with through-wafer etching to define the thin membrane wit ...

2003

Imaging by time-of-flight secondary ion mass spectrometry of plasma patterned metal and oxide thin films

Nava Setter, Paul Muralt, Nicolas Xanthopoulos, Nicolas Ledermann

Time-of-flight secondary ion mass spectrometry (ToF-SIMS) imaging is employed to characterize the surface of patterned noble metal (Pt) and titania (TiO2) thin films deposited on oxidized silicon wafers. ToF-SIMS is used to follow the different process ste ...

2003

Electrochemical Micromachining of Titanium through a Laser Patterned Oxide Film

Patrik Willi Hoffmann, Dieter Landolt

Selective dissolution of titanium through a laser patterned oxide film has been achieved in a 3M sulfuric acid-methanol electrolyte. The 250 nm thick oxide film was formed anodically on a flat titanium surface in 0.5 M sulfuric acid. The patterning of the ...

2001

Contrast mechanisms in high-resolution contact lithography: A comparative study

Olivier Martin

We compare three different approaches to high-resolution contact lithography with special emphasis on contrast mechanisms for subwavelength structures. Masks with protruding metal absorbers, masks with absorbers embedded in the transparent background, and ...

Elsevier2001

New photoplastic fabrication techniques and devices based on high aspect ratio photoresist

Grégoire Genolet

This thesis deals with the development of microfabrication technologies based on photoplastic structuring by lithographic and molding techniques. These technologies, combined with an original releasing method, allow for the simple fabrication of pseudo thr ...

EPFL2001

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