Concept

Accumulator (computing)

Related publications (7)

Multiplier Architectures: Challenges and Opportunities with Plasmonic-based Logic

Giovanni De Micheli, Mathias Soeken, Eleonora Testa, Odysseas Zografos

Emerging technologies such as plasmonics and photonics are promising alternatives to CMOS for high throughput applications, thanks to their waveguide's low power consumption and high speed of computation. Besides these qualities, these novel technologies a ...

2020

Multiplier Architectures: Challenges and Opportunities with Plasmonic-based Logic

Giovanni De Micheli, Mathias Soeken, Eleonora Testa, Odysseas Zografos

IEEE2020

Linebacker: Preserving Victim Cache Lines in Idle Register Files of GPUs

Yunho Oh

Modern GPUs suffer from cache contention due to the limited cache size that is shared across tens of concurrently running warps. To increase the per-warp cache size prior techniques proposed warp throttling which limits the number of active warps. Warp thr ...

ASSOC COMPUTING MACHINERY2019

A Fully Dynamic Universal Accumulator

Serge Vaudenay, Atefeh Mashatan

A dynamic universal accumulator is an accumulator that allows one to efficiently compute both membership and nonmembership witnesses in a dynamic way. It was first defined and instantiated by Li et al., based on the Strong RSA problem, building on the dyna ...

2013

Selective Flexibility: Creating Domain-Specific Reconfigurable Arrays

Paolo Ienne, Mirjana Stojilovic, Philip Brisk, David Novo Bruna

Historically, hardware acceleration technologies have either been application-specific, therefore lacking in flexibility, or fully programmable, thereby suffering from notable inefficiencies on an application-by-application basis. To address the growing ne ...

Institute of Electrical and Electronics Engineers2013

Chemical-mechanical polishing of tungsten

Jelena Stojadinovic

The chemical-mechanical polishing process (CMP) is an essential part of the production of integrated circuits. Metal to be polished in the CMP reacts with the oxidants from the aqueous suspension (slurry) and the passive film is formed on the metal surface ...

EPFL2009

Bipartite modular multiplication method

Marcelo Kaihara

This paper proposes a new modular multiplication method that uses Montgomery residues defined by a modulus M and a Montgomery radix R whose value is less than the modulus M. This condition enables the operand multiplier to be split into two parts that can ...

2008

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