Silicon tetrachloride

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Organic chemistry
Organometallic chemistry

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Nanoparticle Synthesis and Growth in a Continuous Plasma Reactor from Organosilicon Precursors

Elizabeth Buitrago Godinez

Silica-like nanoparticles are produced from four different organosilicon monomers HMDSO, TMDSO, TEOS and TMOS in a continuous non-equilibrium plasma reactor. The nanoparticle synthesis is studied as a function of the process pressure, plasma power, gas vel ...

Wiley-Blackwell2012

High numerical aperture silicon collimating lens for mid-infrared quantum cascade lasers manufactured using wafer-level techniques

Hans Peter Herzig, Lubos Hvozdara, Pierre-Yves Baroni, Joab Di Francesco, Antoine Muller

We present an aspheric collimating lens for mid-infrared (4-14 µ) quantum cascade lasers. The lenses were etched into silicon by an inductively coupled plasma reactive ion etching system on wafer level. The high refractive index of silicon reduces the heig ...

2012

From oxide surface to organic transistor properties: the nature and the role of oxide gate surface defects

Libero Zuppiroli, Stéphane Suarez, Franziska Dora Fleischli

By applying various surface treatments to the oxide gate of pentacene transistors, both in vacuum (H2, O2 and Ar plasma treatments) and in aqueous solution, we were able to vary the balance between oxygen-free radicals (Si•), oxygen-centered radicals (Si−O ...

American Chemical Society2010

Oxygen assisted focused electron beam induced deposition of silicon dioxide

Alexandre Perentes

Focused Electron Beam Induced Deposition (FEBID) is a rapid prototyping technique for the investigation, production and modification of 2 and 3-D nanostructures. The process takes place at room temperature, in the high-vacuum chamber of a Scanning Electron ...

EPFL2007

Ultra-thin hybrid organic/inorganic gas barrier coatings on polymers

Yves Leterrier, Bandeep Singh, Gil Rochat

The oxygen transmission rate of 48 nm thick SiO2 coatings on a poly(ethylene terephthalate) (PET) substrate was reduced by a factor of three after applying an 8 nm thick layer of oligomerized gammaaminopropyltriethoxysilane (γ-APS). Increasing the thicknes ...

2007

Fabrication and functionalization of nanochannels by electron-beam-induced silicon oxide deposition

Jürgen Brugger, Horst Vogel, Christian Santschi, Christophe Danelon

We report on the fabrication and electrical characterization of functionalized solid-state nanopores in low stress silicon nitride membranes. First, a pore of approximately 50 nm diameter was drilled using a focused ion beam technique, followed by the loca ...

2006

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