Nava Setter, Paul Muralt, Enrico Colla, Andreas Seifert, Nicolas Ledermann
Ferroelectric capacitive devices for memory and MEMS applications require patterned ferroelectric thin films with high anisotropic etched features. In this paper, physical and chemical parameters during etching of Pb(Zr0.53Ti0.47)O-3 (PZT) by a dual freque ...
2000