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Network-On-Chip Design and Synthesis Outlook

Influence of abrasive concentration on the qualiy of wire-sawn silicon wafers

System-Level Design for Nano-Electronics

Full wafer integration of NEMS on CMOS by nanostencil lithography

Full wafer integration of NEMS on CMOS by nanostencil lithography

Characterisation and applications of stencil lithography

Nanomechanical structures with 91 MHz resonance frequency fabricated by local deposition and dry etching

Fabrication of Miniaturized Shadow-mask for Local Deposition

Automated wafer-scale fabrication of electron beam deposited tips for atomic force microscopes using pattern recognition

Photochemical etching of Cu and GaAs with Cl2 in the VUV

Fabrication of Miniaturized Shadow-mask for Local Deposition

System-Level Design for Nano-Electronics

Influence of abrasive concentration on the qualiy of wire-sawn silicon wafers

Full wafer integration of NEMS on CMOS by nanostencil lithography

Characterisation and applications of stencil lithography

Automated wafer-scale fabrication of electron beam deposited tips for atomic force microscopes using pattern recognition

Nanomechanical structures with 91 MHz resonance frequency fabricated by local deposition and dry etching

Full wafer integration of NEMS on CMOS by nanostencil lithography

Photochemical etching of Cu and GaAs with Cl2 in the VUV

Network-On-Chip Design and Synthesis Outlook