Thin Film Interference: Si3N4 on Glass

In course

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Description

This lecture discusses the use of thin films of SiO2 or Si3N4 for electrical insulation in electronic and optoelectronic devices. By depositing a transparent Si3N4 layer on glass, with specific refractive indices, the lecture explores the phenomenon of thin film interference and how it can be used to determine the thickness of the layer.

Instructor

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Official source

https://mediaspace.epfl.ch/media/0_43t53rs7

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