Chemical Vapor Deposition: Si, SiN4, SiO2, Diamond

This lecture covers various Chemical Vapor Deposition (CVD) processes, including the LPCVD of polycrystalline and amorphous Si, SiN4, and SiO2, as well as the PECVD of diamond. It explains the applications of poly-Si in microelectronics, such as transistor gates and interconnection materials, and the use of amorphous Si in solar cells. The deposition methods, temperature ranges, and substrates for each material are detailed. Additionally, it discusses the deposition of SiO2 as a mask and isolation layer in microelectronics and the unique properties of diamond, such as high thermal conductivity and chemical inertness.