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Surface nitriding of tetragonal zirconia (t-ZrO2) has been performed with the aim of combining the optical properties of zirconium nitride (ZrN) with the hardness and toughening properties of tetragonal zirconia. A high current d.c. arc plasma source has b ...
Microcrystalline hydrogenated silicon films (muc-Si:H) have been deposited by a high current DC plasma in argon-silane-hydrogen mixtures at growth rates up to 10 nm/s and at substrate temperatures below 500 degreesC. Scanning electron microscopy, X-ray dif ...
