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Christoph Hollenstein

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Christoph Hollenstein

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Study of the microstructure transition width from amorphous to microcrystalline silicon as a function of the input silane concentration

Non-intrusive plasma diagnostics for the deposition of large area thin film silicon

Non-intrusive plasma diagnostics for deposition of large area thin film silicon

Effects of high-speed airflows on a surface dielectric barrier discharge

Time-resolved imaging and spatially-resolved spectroscopy of Electrical Discharge Machining Plasmas

Plasma silane concentration as a determining factor for the transition from amorphous to microcrystalline silicon in SiH4/H-2 discharges

Electromagnetic sources of nonuniformity in large area capacitive reactors

Fast equilibration of silane/hydrogen plasmas in large area RF capacitive reactors monitored by optical emission spectroscopy

Optimization of the microcrystalline silicon deposition efficiency

Microcrystalline silicon deposited at high rate on large areas from pure silane with efficient gas utilization