Emission spectroscopy measurements on a plasma representative of Titan atmosphere composition were obtained in the Inductively Coupled Plasma wind tunnel facility (VKI-Minitorch) at the von Karman Institute in Belgium. Temperatures ranged from 3600 to 5000 ...
Plasma conditions for microcrystalline silicon deposition generally require a high flux of atomic hydrogen, relative to SiH alpha=0 -> 3 radicals, on the growing film. The necessary dominant partial pressure of hydrogen in the plasma is conventionally obta ...
Large area plasma-enhanced chemical vapor deposition of thin films such as silicon nitride or amorphous silicon is widely used for thin film transistor fabrication in the flat panel display industry. A numerical three-dimensional model to calculate the dep ...
