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Yury Kuzminykh

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Related publications (14)

Please note that this is not a complete list of this person’s publications. It includes only semantically relevant works. For a full list, please refer to Infoscience.

Surface Reaction Kinetics of Titanium Isopropoxide and Water in Atomic Layer Deposition

Patrik Willi Hoffmann, Yury Kuzminykh, Michael Oliver Reinke

In atomic layer deposition processes (ALD), surface reactions of adsorbed precursor species lead to the formation of thin films. In order to achieve a well-controlled, self-limiting process, the substrate is sequentially exposed to different precursor mole ...

American Chemical Society2016

Low Temperature Chemical Vapor Deposition Using Atomic Layer Deposition Chemistry

Patrik Willi Hoffmann, Yury Kuzminykh, Michael Oliver Reinke

Chemical vapor deposition (CVD) techniques rely on high temperatures to activate the chemical decomposition of precursors on the substrate surface. Lower temperatures are applied in atomic layer deposition (ALD), where deliberate pyrolysis of the precursor ...

American Chemical Society2015

Combinatorial HV-CVD survey of barium triisopropyl cyclopentadienyl and titanium tetraisopropoxide for the deposition of BaTiO3

Patrik Willi Hoffmann, Yury Kuzminykh, Michael Oliver Reinke

Barium titanate is a very promising material for the integration of optical communication into electronic integrated circuits. For a successful integration into CMOS compatible technology, a growth process has to be found which allows forming crystalline B ...

Wiley-VCH Verlag2015