Wei Tang

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Robust PECVD SiC membrane made for stencil lithography

Jürgen Brugger, Andreea Veronica Savu, Shenqi Xie, Oscar Vazquez Mena, Katrin Sidler Arnet, Wei Tang

Stencil lithography (SL) is a shadow mask based technique which allows parallel, resistless, micro- and nano-patterning of material through apertures in a membrane (stencil) onto a substrate [1]. The stencils are usually made of LPCVD low-stress SiN due to ...

Microelectronic Engineering2011

Robust PECVD SiC membrane made for stencil lithography

Jürgen Brugger, Andreea Veronica Savu, Shenqi Xie, Oscar Vazquez Mena, Katrin Sidler Arnet, Wei Tang

Stencil lithography (SL) is a shadow mask technique which allows parallel, resistless, micro- and nano- patterning of material through apertures created in a membrane (stencil) onto a substrate. The stencils are usually made of LPCVD low-stress SiN due to ...

Elsevier2011

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Robust PECVD SiC membrane made for stencil lithography

Jürgen Brugger, Andreea Veronica Savu, Shenqi Xie, Oscar Vazquez Mena, Katrin Sidler Arnet, Wei Tang

Elsevier2011

Robust PECVD SiC membrane made for stencil lithography

Jürgen Brugger, Andreea Veronica Savu, Shenqi Xie, Oscar Vazquez Mena, Katrin Sidler Arnet, Wei Tang

Microelectronic Engineering2011