Person
Anil Can Kahraman
This person is no longer with EPFL
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Related publications (1)
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Etching selectivity and passivity of Al2O3 layers
The project focuses on etching properties of the atomic layer deposition (ALD) of Al2O3. For this purpose, etching processes such as plasma etch with sulfur hexafluoride (SF6), gas etch with xenon difluoride (XeF2), wet etch with MIF developer (726 MIF) as ...
2023