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This study presents two techniques of structuration of type UV-LIGA (Lithographie, Galvanisierung und Abformung) based on the use of two thick photoresists which are a dry film resist called Riston® from DuPont and the new SU-8 negative-working resist from ...
Ferroelectric thin films for memory and MEMS applications require noble metal or refractory metal oxide electrodes. In this paper, physical and chemical mechanisms during platinum etching by a dual frequency ECR/RF reactor have been investigated. An ion be ...
This paper describes single and two layer processes to realize thick resist moulds (40 and 80 μm) with a good reproducibility. The patterning of a thick AZ 4562 photoresist layer is performed with standard photolithography equipment. Different problems rel ...
Light-coupling masks (LCMs) based on structured organic polymers that make conformal contact with a substrate can constitute an amplitude mask for light-based lithographies. The LCM is exposed through its backside, from where the light is differentially gu ...
Ferroelectric thin films for memory and MEMS applications require noble metal or refractory metal oxide electrodes. In this paper, physical and chemical parameters during etching of RuO2 and Pr by a dual frequency ECR/RF reactor have been investigated. The ...
We compare three different approaches to high-resolution contact lithography with special emphasis on contrast mechanisms for subwavelength structures. Masks with protruding metal absorbers, masks with absorbers embedded in the transparent background, and ...
A new approach for the realization Of true 3D polymer structures is presented in this paper. It consists in adding, in a post-processing microstereolithography step, 3D polymer microstructures on top of a micropart patterned by means of planar processes su ...
A new approach for the realization of true 3D polymer structures is presented in this paper. It consists in adding, in a post-processing microstereolithography step, 3D polymer microstructures on top of a micropart patterned by means of planar processes su ...
This paper presents the fabrication of a microchemical chip for the detection of fluorescence species in microfluidics. The microfluidic network is wet-etched in a Borofloat 33 (Pyrex) glass wafer and sealed by means of a second wafer. Unlike other similar ...
We describe an approach to optical lithography using light-scattering contact masks with protruding elements that couple light into a photoresist. This method differs from conventional contact lithography in two important ways. First, because portions of t ...
