Publication
Optimization of large area YBa2Cu3O7-x films by single target ion beam sputtering
Related publications (34)
Fast ion source and detector for investigating the interaction of turbulence with suprathermal ions in a low temperature toroidal plasma - art. no. 10F503
Yi Zhang, Ambrogio Fasoli, Ivo Furno, Benoît Labit, Mario Ludovico Podesta, Francesca Maria Poli, Gennady Plyushchev
A specific experimental apparatus consisting of an ion source and a detector for the investigation of the interaction between suprathermal ions and drift-wave turbulence is developed on the toroidal plasma experiment. Due to the low plasma temperature (sim ...
2006Reconstruction of ion temperature profiles from single chord NPA measurements on the TCV tokamak
Basil Duval, Alexander Karpushov, Christian Schlatter
The flux of charge exchange ( CX) neutrals measured by neutral particle analysers ( NPAs) is the line integral along the viewline of the NPA and contains information about the ion energy distribution of the observed plasma. On the Tokamaka a Configuration ...
2006Deep reactive ion etching and focused ion beam combination for nanotip fabrication
Luis Guillermo Villanueva Torrijo
We have studied the fabrication of high-aspect ratio silicon tips by a combination of deep reactive ion etching and focused ion beam. The reactive ion etching is used to obtain so-called "rocket tips" which can be fabricated with a high aspect ratio. The r ...
2006Fabrication of nanoelectrodes combining standard microfabrication processes and focused ion beam (FIB)
Luis Guillermo Villanueva Torrijo
We present a method for the production of nanoelectrodes using focussed ion beam techniques (FIB). The electrodes utilise nanometric holes milled in a silicon nitride based pasivation layer, followed by wet etching of a silicon oxide based pasivation layer ...
2004Electrochemical investigation of ion implanted p-Si
The present work investigates the possibility of selective electrochemical metal deposition on ion implanted p-Si. The idea is that defects introduced into the substrate by ion implantation make it more susceptible to electrochemical reactions compared to ...
EPFL2003Neutral beam stabilization of sawtooth oscillations in JET
Olivier Sauter, Antoine Pochelon
Recent experiments in the Joint European Torus (JET) have provided evidence of sawtooth stabilization by fast ions arising from deuterium neutral beam injection (NBI). A possible theoretical basis for the interpretation of the observed sawtooth period beha ...
2002Diffusion of manganese, chromium, and titanium in single crystalline copper
The diffusion of Mn, Cr, and Ti in single crystalline copper was investigated in the temperature range between 582 and 800 K, 639 and 829 It and 621 and 747 K, respectively. Ion beam sputtering in combination with secondary ion mass spectrometry (SIMS) was ...
1998Ion physics and technologies for the trace element analysis
A review, with 9 refs., is given on trace element anal. by mass spectrometry (MS) and potentiometric stripping anal. (PSA). The key question of the problem is detn. of the structure of the samples (i.e. distribution functions and concns. of atoms, mols., c ...
1998Direct writing of gold nanostructures using a gold-cluster compound and a focused ion beam
Hubert van den Bergh, Patrik Willi Hoffmann
Spin-coated solid films of the gold-cluster compd. dodeca-(triphenylphosphine), hexa(chloro)pentapentacontagold Au55(PPh3)12Cl6 are irradiated with a focused 20-keV Ga+ focused-ion beam. Writing speeds on the substrate ranged from 50 up to 2000 mm/s. This ...
1993