Influence of Higher Deposition Temperature on a-Si-H Material Properties, Powder Formation and Light-Induced Degradation, Using the Vhf (70 Mhz) Glow-Discharge Technique
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Hydrogenated amorphous silicon has been prepared at a plasma excitation frequency in the very-high-frequency band at 70 MHz with the glow discharge technique at substrate temperatures between 280 and 50-degrees-C. The structural properties have been studie ...
Results are presented which are geared towards an understanding of the influence of powder formation during film growth. Plasma chemistry is correlated with the morphology, structure (inferred through infrared spectroscopy, scanning electron microscopy and ...
