Acrylated Hyperbranched Polymer Photoresist for Ultra-Thick and Low-Stress High Aspect Ratio Micropatterns
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Most quality management systems (QMS) which integrate software development are based on a single software development method. This particular method is enforced on all projects. The resulting QMS has to fulfil the ISO 9000 standards [13] and enables the co ...
This study presents two techniques of structuration of type UV-LIGA (Lithographie, Galvanisierung und Abformung) based on the use of two thick photoresists which are a dry film resist called Riston® from DuPont and the new SU-8 negative-working resist from ...
When developing an analysis model, the notation itself does not suffice for determining the content of the analysis model and the end of the analysis process. For this, the goals and intents of the analysis model are used, either implicitly or explicitly. ...
Seamlessness is a promise often used to promote object orientation, and the use of object orientation in the different domains and in the different stages of the software development process has brought great improvements in seamlessness. Where can we ...
This paper presents first a formal development methodology that enables the validation of formal specifications as well as program codes wrt client's requirements. The methodology is based on the two languages framework: it advocates the joint use of a mod ...
n this paper we present a method to perform run-time monitoring of distributed applications built on top of a distributed object oriented processing environment. For this, we instrument the code at the compilation time in order to send notifications to an ...
Characterization of the mechanical and thermal properties of the high aspect- ratio, negative, UV resist, SU-S has been carried out. This resist allows for a broad range of thicknesses to be obtained with a single spin process. Standard exposure with a UV ...
This paper presents a new prototyping methodology for large concurrent systems modelled by the means of hierarchical algebraic Petri nets. First, the source specifications are automatically translated into a main-stream object-oriented language, thus provi ...
The development of internal stress during cure of epoxy and hyperbranched polymer- modified epoxy resins was characterized, taking into account the evolving viscoelastic properties, the volumetric shrinkage due to the chemical reaction, and the thermal exp ...
Detailed investigations of the limits of a new negative-tone near-UV resist (IBM SU-8) have been performed. SU-8 is an epoxy-based resist designed specifically for ultrathick, high-aspect-ratio MEMS-type applications. We have demonstrated that with single- ...
