Nanoindentation and birefringence measurements on fused silica specimen exposed to low-energy femtosecond pulses
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Fused silica (a-SiO2) exposure to low-energy femtosecond laser pulses leads to interesting effects such as a local increase of etching rate and/or a local increase of refractive index. Up to now the exact modifications occurring in the glass matrix after e ...
Fused silica (a-SiO 2) exposure to low-energy femtosecond laser pulses (below ablation threshold) introduces a local increase of the HF etching rate. This property has been used to fabricate a variety of structures ranging from simple fluidic channels to m ...
Under certain conditions, femtosecond lasers can be used to introduce self-organized nanogratings in the bulk of fused silica. Here, we report that the nanogratings orientation influences the induced stress distribution around laser affected zones. ...
We directly measure by femtosecond time-resolved x-ray diffraction the E-g symmetry coherent phonon excited in bismuth by a strong optical pulse. The magnitude of the E-g mode observed is 0.2 pm peak-to-peak, compared against the 2.7-pm initial displacemen ...