Accurate simultaneous measurements on the topography and electrostatic force field of 500 nm pitch interdigitated electrodes embedded in a thin SiO2 layer in a plane perpendicular to the orientation of the electrodes are shown for the first time. A static force distance curve (FDC) based method has been developed, which allows a lateral and vertical resolution of 25 and 2 nm, respectively. The measured force field distribution remains stable as result of the well controlled fabrication procedure of Pt cantilever tips that allows thousands of FDC measurements. A numerical model is established as well which demonstrates good agreement with the experimental results. (c) 2008 American Institute of Physics.
Alexandre Terrier, Alain Farron, Patrick Goetti, Matthieu Boubat
Simon Nessim Henein, Charles Baur, Mohammad Hussein Kahrobaiyan, Mohamed Gamal Abdelrahman Ahmed Zanaty
Klaus Kern, Markus Ternes, Abhishek Grewal