Contrast mechanisms in high-resolution contact lithography: A comparative study
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A novel local illumination scheme for optical lithography is proposed. It is based on the excitation of a surface plasmon on a metal film incorporated into a polymer light coupling mask for contact lithography. The electromagnetic field associated with the ...
We discuss the potential and limitations of Light-coupling masks for high-resolution subwavelength optical lithography. Using a three-dimensional fully vectorial numerical approach based on Green's tensor technique, the near-field distribution of the elect ...
New cell-imprint surface modification techni- ques based on direct-cell photolithography and optical soft lithography using poly(dimethylsiloxane) (PDMS) cell imprints are presented for enhanced cell-based studies. The core concept of engineering materials ...
We describe an approach to optical lithography using light-scattering contact masks with protruding elements that couple light into a photoresist. This method differs from conventional contact lithography in two important ways. First, because portions of t ...
