Charge transition levels of carbon-, oxygen-, and hydrogen-related defects at the SiC/SiO2 interface through hybrid functionals

We calculate charge transition levels of various defects at the SiC/SiO2 interface within a scheme based on hybrid density functionals, which accurately reproduce the involved band gaps and band offsets. The defect levels are first evaluated in bulk models of the interface components and then aligned with respect to the interface band diagram through the use of a model interface showing good structural and electronic properties. Interface-specific polarization effects are evaluated separately through classical electrostatics. We considered carbon-related defects involving single atoms and dimers in both the crystalline SiC substrate and the amorphous SiO2 oxide. Our investigation also comprises oxygen-and hydrogen-related defects, including the Si-Si bond (O vacancy), the Si-2-C-O structure, the peroxy linkage, and the hydrogen bridge (Si-H-Si). Among the defects studied, the Si-2-C-O structure represents the best candidate for the high defect density measured near the conduction band of SiC.

Band offsets at semiconductor-oxide interfaces from hybrid density-functional calculations

Audrius Alkauskas, Peter Broqvist, Fabien Devynck, Alfredo Pasquarello

Band offsets at semiconductor-oxide interfaces are determined through a scheme based on hybrid density functionals, which incorporate a fraction alpha of Hartree-Fock exchange. For each bulk component, the fraction alpha is tuned to reproduce the experimental band gap, and the conduction and valence band edges are then located with respect to a reference level. The lineup of the bulk reference levels is determined through an interface calculation, and shown to be almost independent of the fraction alpha. Application of this scheme to the Si-SiO2, SiC-SiO2, and Si-HfO2 interfaces yields excellent agreement with experiment.

2008

Structural and electronic properties of an abrupt 4H-SiC(0001)/SiO2 interface model: Classical molecular dynamics simulations and density functional calculations

Peter Broqvist, Fabien Devynck, Alfredo Pasquarello

Using a density functional approach, we study structural and electronic properties of the 4H(0001)-SiC/SiO2 interface. Through the sequential use of classical and ab initio simulation methods, we generate an abrupt model structure which describes the transition between crystalline SiC and amorphous SiO2 without showing any coordination defect. The first step in our generation procedure consists in identifying suitable interfacial bonding patterns which account for the bond density reduction across the interface. In the second step, the connection to amorphous SiO2 is achieved through classical molecular dynamics. The atomic positions are then relaxed within a generalized gradient approximation of density functional theory. The final model structure shows good structural parameters and an oxide density typical of amorphous SiO2. We investigate the electronic structure of the generated model interface through the local density of states obtained with hybrid density functionals. In our atomically abrupt interface model, the full oxide band gap is recovered at a distance of similar to 5 A from the interface. This extent is in good agreement with estimates derived from internal photoemission measurements and provides support for the abrupt nature of the interface. We obtained band offsets through two different procedures: by evaluating the local density of states and by aligning the band extrema through the local electrostatic potential. Band offsets calculated with various functionals are compared to experimental values. The best agreement is achieved for a hybrid functional in which a screened Coulomb potential is used in the Hartree-Fock exchange term. For this case, the calculated band offsets underestimate the experimental values by similar to 25%, but agree with experiment within a few percent when expressed with respect to the oxide band gap.

2007

Charge transition levels of nitrogen dangling bonds at Si/SiO2 interfaces: A first-principles study

Peter Broqvist, Philipp Dahinden, Alfredo Pasquarello

The defect levels of the nitrogen dangling bond at the Si/SiO2 interface are determined through a density-functional approach. The composition grading at the interface is modeled through crystalline and amorphous models of stoichiometric SiO2, nitrided SiO2, and substoichiometric silicon oxides. The relevant charge transition levels are first determined with respect to the band edges of the parent oxides within a semilocal density-functional scheme. Through the use of band edge shifts and band offsets previously obtained with hybrid functionals, the calculated defect levels are then positioned with respect to a band diagram of the Si/SiO2 interface which shows good agreement with the experimental one. We find that the 0/- charge transition level locates within the Si band gap. The level locates close to the Si valence band for nitrogen atoms in the stoichiometric oxide, but is found to rise across the silicon band gap as the environment of the nitrogen atoms becomes more silicon rich. The latter raise is accompanied by a stabilization of the incorporated nitrogen.

2010

Structural and electronic properties of an abrupt 4H-SiC(0001)/SiO2 interface model: Classical molecular dynamics simulations and density functional calculations

Peter Broqvist, Fabien Devynck, Alfredo Pasquarello

2007