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High quality factor copper inductors integrated in deep dry-etched quartz substrates

Related publications (41)

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Development of MEMS-based programmable slit mask for Multi-Object Spectroscopy

Nico de Rooij, Michael David Canonica, Wilfried Noell

We are developing MEMS-based programmable reflective slit masks for future generation infrared multi-object spectroscopy (MOS) for space and ground-based telescopes. These devices are composed of monocrystalline silicon micromirrors of size 200 x 100 um(2) ...

Spie-Int Soc Optical Engineering, Po Box 10, Bellingham, Wa 98227-0010 Usa2010

Nanogap MEM resonators on SOI

Nicoleta-Diana Ciressan

Today's consumer electronics based on a large variety of time-keeping and frequency reference applications is based on quartz-crystal oscillators, because of their excellent performances in terms of quality factor, thermal and frequency stability. However, ...

EPFL2009

Copper / low-k technological platform for the fabrication of high quality factor above-IC passive devices

Modern communication devices demand challenging specifications in terms of miniaturization, performance, power consumption and cost. Every new generation of radio frequency integrated circuits (RF-ICs) offer better functionality at reduced size, power cons ...

EPFL2007

Design and fabrication of suspended-gate MOSFETs for MEMS resonator, switch and memory applications

Nicolas Abelé

Wireless communication systems and handset devices are showing a rapid growth in consumer and military applications. Applications using wireless communication standards such as personal connectivity devices (Bluetooth), mobile systems (GSM, UMTS, WCDMA) an ...

EPFL2007

Above-IC RF MEMS devices for communication applications

Raphaël Fritschi

Wireless communications are showing an explosive growth in emerging consumer and military applications of radiofrequency (RF), microwave, and millimeter-wave circuits and systems. Applications include wireless personal connectivity (Bluetooth), wireless lo ...

EPFL2007

Fabrication of silicon nano wires and gate-all-around MOS devices

Didier Bouvet, Kirsten Emilie Moselund

The invention relates to methods for manufacturing semiconductor devices. Processes are disclosed for implementing suspended single crystal silicon nano wires (NWs) using a combination of anisotropic and isotropic etches and spacer creation for sidewall pr ...

2007

Interface issues in organic semiconductor based devices

Mauro Castellani

The present doctoral thesis aims to contribute to the field of organic semiconductor physics and technology, both of which have become fast growing disciplines. Two technological applications are emerging from these research efforts: Organic light-emitting ...

EPFL2006

Nanostencil lithography for nanowire patterning

Jürgen Brugger, Marc Antonius Friedrich van den Boogaart

Stencil lithography is an innovative method for patterning that has a great flexibility from many points of view. It is based on shadow mask evaporation using thin silicon nitride membranes that allow the patterning of sub-100 nm features up to 100 μm in a ...

2006

High-quality radio-frequency inductors on silicon using a hybrid ferrite technology

Martinus Gijs

We have realized millimeter-size rf inductors on silicon using a polyimide mold–copper electroplating coil technology. Subsequently, the coils are assembled with magnetic cover plates of commercially available bulk Ni–Zn ferrites of high resistivity. Using ...

2004

Free-standing, mobile 3D porous silicon microstructures

Philippe Renaud, Gerhard Lammel

This paper suggests a new fabrication method for surface micromachining based on porous silicon formation followed by electropolishing. in contrast to its known use as a sacrificial layer, in this work, porous silicon will be employed as constitutive mater ...

2000