Large micromirror array for generating programmable slit masks for Multi-Object Spectroscopy

Multi-object spectroscopy (MOS) is a powerful tool for space and ground-based telescopes for the study of the formation and evolution of galaxies. This technique requires a programmable slit mask for astronomical object selection. We are engaged in a European development of micromirror arrays (MMA) for generating reflective slit masks in future MOS, called MIRA. The 100 x 200 mu m(2) micromirrors are electrostatically tilted providing a precise angle. The main requirements are cryogenic environment capabilities, precise and uniform tilt angle over the whole device, uniformity of the mirror voltage-tilt hysteresis and a low mirror deformation. A first M MA with single-crystal silicon micromirrors was successfully designed, fabricated and tested. A new generation of micromirror arrays composed of 2048 micromirrors (32 x 64) and modelled for individual addressing were fabricated using fusion and eutectic wafer-level bonding. These micromirrors without coating show a peak-to-valley deformation less than 10 nm, a tilt angle of 24 degrees for an actuation voltage of 130 V Individual addressing capability of each mirror has been demonstrated using a line-column algorithm based on an optimized voltage-tilt hysteresis. Devices are currently packaged, wire-bonded and integrated to a dedicated electronics to demonstrate the individual actuation of all micromirrors on an array. An operational test of this large array with gold coated mirrors has been done at cryogenic temperature (162 K): the micromirrors were actuated successfully before, during and after the cryogenic experiment. The micromirror surface deformation was measured at cryo and is below 30 nm peak-to-valley.

MEMS-based programmable reflective slit mask for multi-object spectroscopy

Michael David Canonica, Nico de Rooij, Wilfried Noell

Multi-object spectroscopy is a powerful tool for space and ground-based telescopes for the study of the formation of galaxies. This technique requires a programmable slit mask for astronomical object selection. We are developing MEMS-based programmable reflective slit masks for multi-object spectroscopy that consist of micromirror arrays on which each micromirror of size 100 x 200 mu m(2) is electrostatically tilted providing a precise angle. The main requirements for these arrays are cryogenic environment capabilities, precise and uniform tilt angle over the whole device, uniformity of the mirror voltage-tilt hysteresis and a low mirror deformation. A first generation of MEMS-based programmable reflective slit masks composed of 5 x 5 micromirrors was tested in cryogenic conditions at 92 K. Then, first prototypes of large arrays were microfabricated and characterized, but the reliability of these arrays had to be improved. To increase the reliability of these devices, a third generation of micromirror arrays composed of 64 x 32 micromirrors is under development. This generation was especially designed for individual actuation of each mirror, applying a line-column algorithm based on the voltage-tilt hysteresis of the actuator. The fabrication process was optimized and is now based on multiple wafer level bonding steps. Microfabricated devices have micromirror with a peak-to-valley deformation less than 3 nm. The mirrors can be tilted at 20 degrees by an actuation voltage lower than 100 V. First experiments showed that our micromirrors are well suited for the line-column addressing of each micromirror.

Spie-Int Soc Optical Engineering, Po Box 10, Bellingham, Wa 98227-0010 Usa2011

Large micromirror array for multi-object spectroscopy in cryogenic environment

Michael David Canonica, Nico de Rooij, Wilfried Noell

Next-generation infra-red astronomical instrumentation for space and ground-based telescopes requires MOEMS-based programmable slit masks for multi-object spectroscopy (MOS) which has to work in cryogenic environment. A first prototype of micromirror arrays (MMA) of 5 x 5 single-crystal silicon micromirrors was successfully designed, fabricated and tested. 100 x 200 mu m(2) micromirrors can be tilted by electrostatic actuation yielding 20 degrees mechanical tilt-angle. The MMA were successfully actuated before, during and after cryogenic cooling, below 100 K. A MMA is composed of two different chips fabricated on silicon on insulator (SOI) wafers: the mirror chip and the electrode chip. The array was obtained by assembling these two chips. For the assembly step of large array (100 x 200 micromirrors) we needed high precision alignment as well as the suppression of manual handling. Therefore we developed a technique of assembly for such devices and we designed and fabricated a dedicated XYZ tip/tilt stage. This stage allows aligning the electrodes towards the micromirrors with a micrometer precision. Large MMA of 100 x 200 micromirrors, measuring 22 mm x 25 mm, for large field of view were microfabricated and assembled using the above setup. No additional deformations were observed due to the assembly step. The peak to valley (PTV) deformation of the micromirrors was found to be 14 nm PTV. The first actuation tests were carried out.

Spie-Int Soc Optical Engineering, Po Box 10, Bellingham, Wa 98227-0010 Usa2009

Development of MEMS-based programmable slit mask for Multi-Object Spectroscopy

Michael David Canonica, Nico de Rooij, Wilfried Noell

We are developing MEMS-based programmable reflective slit masks for future generation infrared multi-object spectroscopy (MOS) for space and ground-based telescopes. These devices are composed of monocrystalline silicon micromirrors of size 200 x 100 um(2) which can be tilted by electrostatic actuation yielding a tilt-angle of 20 degrees. An electromechanical clamping mechanism has been demonstrated providing uniform tilt-angle within one arc minute precision over the whole array (5 x 5 micromirrors). Slit masks of different sizes have been produced; the largest one measures 25 x 22 mm(2) and is composed of 20'000 micromirrors. Thanks to the architecture and the fabrication process of these slit masks; the micromirror peak-to-valley deformation (PTV) is uniform over the device and was measured being below 10 nm for uncoated micromirror. A slit mask of size 5 x 5 micromirrors was successfully tested in cryogenic conditions at 92 K; the micromirrors were actuated before, during and after the cryogenic experiment. To achieve for the large arrays a better fabrication yield and a higher reliability, the architecture, the process flow, the assembly and the electronics are being optimized. Optical characterizations as well as experiments of the large devices are underway.

Spie-Int Soc Optical Engineering, Po Box 10, Bellingham, Wa 98227-0010 Usa2010