Application of stencil masks for ion beam lithographic patterning
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A novel local illumination scheme for optical lithography is proposed. It is based on the excitation of a surface plasmon on a metal film incorporated into a polymer light coupling mask for contact lithography. The electromagnetic field associated with the ...
A 2×2 microfluidic-based optical switch is proposed and demonstrated. The switch is made of an optically clear silicon elastomer, Polydimethylsiloxane (PDMS), using soft lithography. It has insertion loss smaller than 1 dB and extinction ratio on the order ...
Sub-micron scale lithography methods using deep UV, X-ray or electron beams will allow for further progress in integrated circuit hardware manufacturing. The drawback of these high-end patterning methods however is firstly, the high cost of the equipment, ...
We describe an approach to optical lithography using light-scattering contact masks with protruding elements that couple light into a photoresist. This method differs from conventional contact lithography in two important ways. First, because portions of t ...
A carbon-based interdigitated electrode array (IDA) was fabricated by photolithographic patterning of RF sputtered thin-film carbon layers. The IDAs consisted of 125 pairs having the finger width of 2.5 μm and 1.5 μm gap. The electrochemical behavior of th ...
Light-coupling masks (LCMs) based on structured organic polymers that make conformal contact with a substrate can constitute an amplitude mask for light-based lithographies. The LCM is exposed through its backside, from where the light is differentially gu ...
