Contributions to the contact resistivity in fired tunnel-oxide passivating contacts for crystalline silicon solar cells

We investigate the contact resistivity of p-type passivating contacts for silicon solar cells. Our contact structures are compatible with firing, a rapid annealing process similar to the one used for sintering of the screen-printed metallisation in solar cell manufacturing. We find that the short firing process crystallises the doped layers and incorporates active boron dopants up to the solubility concentration at the chosen firing temperature. The dependence of our contact resistivities on carrier density and temperature suggest that the hole transport is a combination of tunnelling through the oxide at the wafer surface and of thermionic field emission over the Schottky barrier to the metallisation. For ideal firing conditions we find implied open circuit voltages up to 720 mV and contact resistivities as low as 15 mΩcm2.

Electrostatically Induced Superconductivity at the Surface of WS2

Helmuth Berger

We investigate transport through ionic liquid gated field effect transistors (FETs) based on exfoliated crystals of semiconducting WS2. Upon electron accumulation, at surface densities close to, or just larger than, 10(14) cm(2), transport exhibits metallic behavior with the surface resistivity decreasing pronouncedly upon cooling. A detailed characterization as a function of temperature and magnetic field clearly shows the occurrence of a gate-induced superconducting transition below a critical temperature Tc 4 K, a finding that represents the first demonstration of superconductivity in tungsten-based semiconducting transition metal dichalcogenides. We investigate the nature of superconductivity and find significant inhomogeneity, originating from the local detaching of the frozen ionic liquid from the WS2 surface. Despite the inhomogeneity, we find that in all cases where a fully developed zero resistance state is observed, different properties of the devices exhibit a behavior characteristic of a BerezinskiiKosterlitzThouless transition, as it could be expected in view of the two-dimensional nature of the electrostatically accumulated electron system

Amer Chemical Soc2015

Window Layers for Silicon Heterojunction Solar Cells

Johannes Peter Seif

Currently, crystalline silicon (c-Si) wafer-based solar cells dominate the photovoltaic market (80-90%). In this thesis we concentrate on silicon heterojunction (SHJ) solar cells that--in contrast to diffused homojunction cells--rely on the application of amorphous silicon (a-Si:H) thin films. Unlike standard homojunction devices, which are typically limited by their highly recombination-active semiconductor-to-metal contacts, SHJ devices exhibit excellent surface passivation enabled by intrinsic and doped a-Si:H films. These a-Si:H layers, however, entail drawbacks for optical performance and carrier transport, two topics that will be addressed in this work. To this end we investigate non-traditional materials for SHJ devices, with the goal of replacing the a-Si:H or the transparent electrodes. These materials include microcrystalline silicon (uc-Si:H) and organic semiconductors for contact formation; amorphous silicon suboxides (a-SiOx:H) for surface passivation; and transparent electrodes applied by atomic layer deposition (ALD) as protective layers against subsequent processing steps. Along with the optical and electrical properties of these materials, we study the impact on device performance associated with their deposition. For this we test the devices under standard testing conditions (25 °C) and at elevated temperatures closer to those encountered in the field. For the investigations on uc-Si:H layers, we vary process parameters (including temperature, pressure, power, excitation frequency and hydrogen dilution) as well as pre-treatments, gas variations and nucleation layers. We assess the suitability of these approaches for SHJ solar cells and apply selected measures in devices. Thereby we demonstrate a gain in short-circuit current density in the range of 0.5-1 mA.cm-2 and good fill factor values of up to 79.2% using either n- and p-type uc-Si:H layers. Furthermore, with the goal of reducing optical losses, we test wide-bandgap a-SiOx:H layers for passivation. In terms of current gain without negative side effects on transport, we argue that these layers are best applied to the electron-collecting contact--put at the front of the device--as their application to the hole-collecting contact introduces a transport barrier for holes. This barrier deteriorates the device performance at 25 °C, but shows a beneficial effect on the temperature coefficient of the device, yielding coefficients as low as -0.1%/°C. In some cases--compared to standard devices--devices with a-SiOx:H layers exhibit superior performance at elevated temperatures, which can be of interest in warmer climates. In parallel to these main topic we also study aluminium-doped zinc oxide (ZnO:Al) layers deposited by ALD as a protective layer against sputter-induced damage and organic semiconductors as transparent electrodes for the hole-collecting contact. In both cases we observe a gain in terms of surface passivation, which indicates that these materials may be beneficial for the contact formation in future device structures. In addition to these material-related investigations, we unravel the temperature-dependence of each individual cell parameter and present a brief comparison of state-of-the-art technologies and their respective temperature dependence.

EPFL2015

Explaining Morphological and Electrical Features of Boron-doped Zinc Oxide to Tailor New Electrodes for Photovoltaics

Lorenzo Fanni

TCOs are a class of metal oxides that combine transparency to visible light with electrical conductivity. Each TCO is characterized by the trade-off of these two properties which can be tuned for a particular application. This thesis is dedicated to the investigation of one TCO material: boron doped zinc oxide (ZnO:B) deposited by low-pressure chemical vapor deposition (LP-MOCVD). Its main distinction is low absorptance which makes ZnO films deposited by LP-MOCVD ideal as transparent electrodes in thin-film solar cells. Although ZnO:B properties have previously been optimized for this application, the exact processes behind the film formation have not been fully described. This thesis substantially clarifies the processes of the film nucleation and growth evolution, and the mechanisms of incorporation of the B atoms into the ZnO. First, for non-intentionally doped ZnO we establish that the main deposition parameters influencing the film properties are the deposition temperature, the gas precursor ratio and the total gas flow. We experimented with these three parameters across a wide range of parameter values. The films deposited were characterized at different stages of their growth using atomic force microscopy, X-ray diffraction and automated crystallographic orientation mapping. These data reveal the dependence of the film preferential orientation on the deposition conditions. We propose a model based on the adsorbed atom mean free path to explain this dependence. Using deposition parameters learnt from this model, we control the preferential orientation during film growth to increase the grain sizes. Second, we analyze the conductivity to B-doped ZnO films. Boron atoms act as electron donors in ZnO, increasing the electrical conductivity and decreasing the transparency. This work quantifies how the B concentration and spatial distribution affect the film conductivity. Quantification of the B atoms incorporated in the film was performed using nuclear reaction analysis. We found that a high level of O precursor gas favors B incorporation in the film. Combining nano secondary ion mass spectroscopy and Kelvin probe force microscopy we demonstrate that the dopant atoms incorporate in only one of the two sides of each grain. This is a new observation because dopant atoms are commonly assumed to be uniformly distributed in the film. The transparency and electrical conductivity of ZnO depend also on the carrier mobility. The sources of carrier scattering are investigated for intrinsic (i.e. O vacancies and Zn interstitials) and extrinsic (B atoms) impurity concentrations. We observed that for the same B concentration the source of electron scattering depends on the concentration of intrinsic defects: for films with a lower concentration of intrinsic defects, the main source of scattering is the grain boundaries; for films with a higher concentration of intrinsic defects, the main sources are the mechanisms happening in the crystalline region. Finally, LP-MOCVD ZnO:B films were optimized using the previous results and successfully applied in four different types of solar cells: amorphous/microcrystalline silicon, amorphous silicon, copper indium gallium selenide and silicon heterojunction. The advantages of the developed films to these four cells include the simplification of the fabrication process, the reduction of reflectance and parasitic absorption, and a better understanding of carrier transport mechanisms through the device.