Interprocedural optimizationInterprocedural optimization (IPO) is a collection of compiler techniques used in computer programming to improve performance in programs containing many frequently used functions of small or medium length. IPO differs from other compiler optimizations by analyzing the entire program as opposed to a single function or block of code. IPO seeks to reduce or eliminate duplicate calculations and inefficient use of memory and to simplify iterative sequences such as loops.
Nanocrystal solar cellNanocrystal solar cells are solar cells based on a substrate with a coating of nanocrystals. The nanocrystals are typically based on silicon, CdTe or CIGS and the substrates are generally silicon or various organic conductors. Quantum dot solar cells are a variant of this approach which take advantage of quantum mechanical effects to extract further performance. Dye-sensitized solar cells are another related approach, but in this case the nano-structuring is a part of the substrate.
Optimizing compilerIn computing, an optimizing compiler is a compiler that tries to minimize or maximize some attributes of an executable computer program. Common requirements are to minimize a program's execution time, memory footprint, storage size, and power consumption (the last three being popular for portable computers). Compiler optimization is generally implemented using a sequence of optimizing transformations, algorithms which take a program and transform it to produce a semantically equivalent output program that uses fewer resources or executes faster.
Thermal efficiencyIn thermodynamics, the thermal efficiency () is a dimensionless performance measure of a device that uses thermal energy, such as an internal combustion engine, steam turbine, steam engine, boiler, furnace, refrigerator, ACs etc. For a heat engine, thermal efficiency is the ratio of the net work output to the heat input; in the case of a heat pump, thermal efficiency (known as the coefficient of performance) is the ratio of net heat output (for heating), or the net heat removed (for cooling) to the energy input (external work).
Chemical vapor depositionChemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.
