SETTING-UP AND EVALUATION OF UV-IMPRINT LITHOGRAPHY
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We propose and demonstrate the ability and efficiency of using a universal file format for a nanolithography pattern. A problem faced by the physicists working in the field of nanolithography is a lack of a flexible pattern design software (possibly open–s ...
Sub-micron scale lithography methods using deep UV, X-ray or electron beams will allow for further progress in integrated circuit hardware manufacturing. The drawback of these high-end patterning methods however is firstly, the high cost of the equipment, ...
Characterization of the mechanical and thermal properties of the high aspect- ratio, negative, UV resist, SU-S has been carried out. This resist allows for a broad range of thicknesses to be obtained with a single spin process. Standard exposure with a UV ...
Increased flexibility in patterning becomes important for the engineering of advanced nano/micro-electro-mechanical systems (NEMS/MEMS). Surfaces to be structured are either mechanically unstable and/or (bio-) chemically functionalized, such as ultra-thin ...