Unit
Laboratory for Photonic Materials and Characterization
LaboratoryRelated publications (32)
Control of intermetallics in the interface in directed energy deposition of titanium on stainless steel 316L
Application of a single metal or alloy is often restricted by its properties from optimal combination of performance and cost. Therefore, there is a vast need of joining dissimilar metals for various applications in biomedical, aerospace, automobile and ma ...
EPFL2023Microstructure and ferroelectricity of BaTiO3 thin films on Si for integrated photonics
Patrik Willi Hoffmann, Michael Oliver Reinke, Chiara Marchiori
Significant progress has been made in integrating novel materials into silicon photonic structures in order to extend the functionality of photonic circuits. One of these promising optical materials is BaTiO3 or barium titanate (BTO) that exhibits a very l ...
Institute of Physics2017Surface Reaction Kinetics of Titanium Isopropoxide and Water in Atomic Layer Deposition
Patrik Willi Hoffmann, Yury Kuzminykh, Michael Oliver Reinke
In atomic layer deposition processes (ALD), surface reactions of adsorbed precursor species lead to the formation of thin films. In order to achieve a well-controlled, self-limiting process, the substrate is sequentially exposed to different precursor mole ...
American Chemical Society2016Surface Kinetics of Titanium Isopropoxide in Chemical Vapor Deposition of Titanium Dioxide and Barium Titanate
All chemical vapor deposition (CVD) processes rely on the adsorption and decomposition of precursors on a substrate to deposit the desired material. The growth rate of the film is determined by the surface kinetics of the utilized precursor molecules and g ...
EPFL2016Explaining Morphological and Electrical Features of Boron-doped Zinc Oxide to Tailor New Electrodes for Photovoltaics
TCOs are a class of metal oxides that combine transparency to visible light with electrical conductivity. Each TCO is characterized by the trade-off of these two properties which can be tuned for a particular application. This thesis is dedicated to the in ...
EPFL2016Combinatorial Characterization of TiO2 Chemical Vapor Deposition Utilizing Titanium Isopropoxide
Patrik Willi Hoffmann, Yury Kuzminykh, Michael Oliver Reinke, Evgeniy Ponomarev
The combinatorial characterization of the growth kinetics in chemical vapor deposition processes is challenging because precise information about the local precursor flow is usually difficult to access. In consequence, combinatorial chemical vapor depositi ...
ACS Publications2015Surface Kinetics of Titanium Isopropoxide in High Vacuum Chemical Vapor Deposition
Patrik Willi Hoffmann, Yury Kuzminykh, Michael Oliver Reinke
Understanding the surface kinetics of precursor decomposition during thin film formation represents a key aspect in the understanding and engineering of chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes. The determination of activ ...
American Chemical Society2015Pulsed laser deposition growth of 3D ZnO nanowall network in nest-like structures by two-step approach
Gwénolé Jean Jacopin, Mahmoud Saeed Qaid Mohammad Hezam
The mechanism for the growth of 3D ZnO nanowall networks in nest-like structure by a pulsed laser deposition (PLD) technique have been investigated for dye sensitized solar cells (DSSCs) and biosensor applications. As complex oxides shift towards large vol ...
Elsevier2015Selective Growth of Titanium Dioxide by Low-Temperature Chemical Vapor Deposition
Patrik Willi Hoffmann, Yury Kuzminykh, Michael Oliver Reinke
A key factor in engineering integrated optical devices such as electro-optic switches or waveguides is the patterning of thin films into specific geometries. In particular for functional oxides, etching processes are usually developed to a much lower exten ...
Amer Chemical Soc2015Precursor adsorption efficiency of titanium tetra isopropoxide in the presence of a barium beta-diketonate precursor
Patrik Willi Hoffmann, Yury Kuzminykh, Michael Oliver Reinke
Barium titanate is a promising candidate for integrated photonic application due to its high electro-optic coefficient; therefore the need arises for a suitable deposition technique which provides high film quality at low temperatures (below 500 degrees C) ...
Elsevier Science Sa2013