Arséniure de gallium | EPFL Graph Search

L'arséniure de gallium est un composé chimique de formule brute GaAs appartenant à la famille des semiconducteurs -. C'est un matériau semi-conducteur à gap direct présentant une structure cristalline cubique de type sphalérite (blende). Il est utilisé notamment pour réaliser des composants micro-ondes, des circuits intégrés monolithiques hyperfréquences, des composants opto-électroniques, des diodes électroluminescentes dans l'infrarouge, des diodes laser, des cellules photovoltaïques et des fenêtres optiques. Le GaAs est dit « - » car le gallium et l’arsenic se trouvent respectivement dans le groupe 13 et le groupe 15 du tableau périodique, appelés jadis colonne B et colonne B, et donc trois et cinq électrons de valence. L'arséniure de gallium est couramment utilisé comme substrat pour la croissance épitaxiale d'autres - tels que l'arséniure d'indium-gallium et l'arséniure d'aluminium-gallium . Structure cristalline L'arséniure de gallium présente une structure crist

Electronic transport properties of vertical and lateral graphene-based heterostructures

Roberto Urcuyo Solorzano

Graphene has some drawbacks, like the absence of an electronic band gap which leads to only small gate switching ratios, and its fast carrier recombination that limits its use in optoelectronics. In order to overcome these issues, the aim of this thesis was to tune the properties of graphene by two different modification approaches. The first approach involved chemical functionalization to create lateral graphene heterostructures, whereas the second approach was directed toward vertical heterostructures that combine graphene with another 2D material. For the former case, two novel chemical functionalization methods were investigated. The first method relied upon hyperthermal molecular ion collisions with 4,4¿-azobis(pyridine). This enabled the covalent functionalization of graphene with a functionalization degree of up to 3%, as demonstrated by Raman in combination with XPS. AFM studies revealed that the functionalized sheets retain their topographic integrity. Thus obtained stripe-like patterns of covalently graphene within extended graphene sheets enabled enhanced on/off ratios upon gate switching. In the second functionalization, OsO4 was used to selectively introduce hydroxyl groups to graphene. Best results were obtained using UV light activation, which yielded graphene of high covalent functionalization degree, as concluded from its optical transparency and gate-induced on/off switching ratios of up to 500. Temperature dependent electrical measurements revealed 2D hopping as the dominant transport mechanism. The first type of vertical heterostructure, gr-TiOx-Ti diodes were fabricated and their electrical properties in the dark and under visible light illumination studied. In contrast to conventional MIM diodes, the performance of the graphene-based diodes was found to increase with decreasing thickness of the oxide insulator. Bias-induced modulation of the work function of graphene was identified as the key to the operation mechanism of the graphene diodes, enabling them to reach a very high asymmetry and nonlinearity (9000 and 8). The diodes compete well with state-of-the-art MIM diodes. Furthermore, the graphene-TiOx-Ti diodes could be operated as photovoltaic cell, with a maximum open-circuit voltage of 0.3 V and a short-circuit photocurrent of 14 nA under global illuminationt. This finding constitutes the first proof-of-principle of hot carrier extraction from graphene, based on the photovoltaic effect. The second type of vertical heterostructures was based on black phosphorus (BP). As a first step, thin BP sheets were combined with n-GaAs into novel pn devices. They displayed pronounced rectification behavior that, in the low bias regime, approaches that of ideal diodes. Moreover, when operated as photodiodes they reached external quantum efficiencies (EQE) above 30% under higher reverse bias. On this basis, the bP was then combined with gr into a p+/p heterojunction. Thus obtained devices achieved a maximum internal quantum efficiency (IQE) and responsivity of 13% and 10.7 mA/W, respectively. This IQE is the highest thus far reported for diodes comprising BP and another 2D material. Moreover, with the aid of a top gate it was possible to modulate both, the photo-conversion efficiency and photocurrent generation mechanism of the black phosphorous-graphene diodes. Together with the possibility to tune the photocurrent response by the thickness of the black phosphorous, these diodes emerge as promising photodetectors.

EPFL2016

Ab initio study of interface states at metal contacts to III-IV semiconductors

Thomas Maxisch

We present a theoretical study of the physical characteristics of metal/semiconductor junctions. Using first principle pseudopotential calculations, we have investigated the nature of electronic states with energies within the semiconductor band gap of representative abrupt, defect-free, anion-terminated metal/III-V interfaces. Namely, we focused on Al contacts to GaAs(001), AlAs(001) and cubic GaN(001) as well as on Al, Au and Cu junctions to cubic GaN(001). Recent advances in Schottky barrier concepts emphasize the possible relationship between interface states and the formation of the Schottky barrier. We aim at understanding the atomic-scale mechanisms responsible for interface states as well as their role in the Schottky barrier formation process. At As-terminated Al/GaAs(001) and Al/AlAs(001) junctions, resonant and localized interface states occur at the J point of the interface 2D Brillouin zone near the Fermi energy in the semiconductor midgap region. They correspond to intermetallic bonds between the outermost cation atoms of the semiconductor and the interfacial Al atoms of the metal. These interface states derive from an interaction between localized states of the Al(001) surface and semiconductor conduction band states, mediated by localized states of the unreconstructed, As-terminated semiconductor (001) surface. Our results indicate that interface states of the intermetallic, bonding-like kind could play an important role in the transport properties of metal/AlxGa1-xAs junctions. We have also investigated the electronic structure of Al, Au and Cu junctions to cubic, N-terminated GaN(001). The localized interface state reported for As-terminated Al/GaAs(001) and Al/AlAs(001) junctions occurs also at metal/GaN interfaces under the condition that atoms on the outermost atomic plane of the metal are placed in front of the outermost semiconductor cation. This indicates that the formation mechanism of this state is a very general one. In contrast to Al/AlxGa1-xAs junctions, these states occur at energy much larger than EF for the contacts to GaN. Thus, they are not expected to contribute significantly to the electronic transport of the latter interfaces. However, a large number of interface states attributed to d-type orbitals occur over a wide energy range including EF at contacts of noble metals to GaN.

EPFL2003

P-Doping Mechanisms in Catalyst-Free Gallium Arsenide Nanowires

Carlo Colombo, Anna Fontcuberta i Morral, Tonko Garma, Bernt Ketterer, Marco Nicotra, Emanuele Uccelli

Doped catalyst-free GaAs nanowires have been grown by molecular beam epitaxy with the gallium-assisted method. The spatial dependence of the dopant concentration and resistivity have been measured by Raman spectroscopy and four point electrical measurements. Along with theoretical considerations, the doping mechanisms have been revealed. Two competing mechanisms have been revealed: dopant incorporation from the side facets and from the gallium droplet. In the latter incorporation path, doping compensation seems to play an important role in the effective dopant concentration. Hole concentrations of at least 2.4 x 10(18) cm(-3) have been achieved, which to our knowledge is the largest p doping range obtained up to date. This work opens the avenue for the use of doped GaAs nanowires in advanced applications and in mesoscopic physics experiments.

American Chemical Society2010