Concept

Diffusion de surface

Publications associées (38)

Co-Adsorption of Alcohols and Water in JUK-8 Studied Using Quasi-Equilibrated Thermodesorption

JUK-8 ([Zn(oba)(pip)]n, oba2- = 4,4 '-oxybis(benzenedicarboxylate), pip = 4-pyridyl-functionalized benzene-1,3-dicarbohydrazide) is a hydrolytically stable flexible metal-organic framework. Owing to its unusual adsorptive properties, JUK-8 can be considere ...

MDPI2024

Selective area epitaxy of GaAs: the unintuitive role of feature size and pitch

Anna Fontcuberta i Morral, Lucas Güniat, Didem Dede, Valerio Piazza, Elif Nur Dayi, Martin George Friedl, Vladimir Dubrovskii, Nicholas Paul Morgan, Akshay Balgarkashi

Selective area epitaxy (SAE) provides the path for scalable fabrication of semiconductor nanostructures in a device-compatible configuration. In the current paradigm, SAE is understood as localized epitaxy, and is modelled by combining planar and self-asse ...

IOP Publishing Ltd2022

Bond-selective and surface-site-specific dissociation of methane on platinum

Ana Gutiérrez González

I present a molecular beam study of methane dissociation on differ-ent surface sites of several platinum single crystal surfaces (Pt(111), Pt(211), Pt(210), Pt(110)-(2x1)). The experiments were performed in a molecular beam/surface-science apparatus that c ...

EPFL2019

The role of the crystalline face in the ordering of 6-mercaptopurine self-assembled monolayers on gold

Klaus Kern

Well-ordered molecular films play an important role in nanotechnology, from device fabrication to surface patterning. Self-assembled monolayers (SAMs) of 6-mercaptopurine (6MP) on the Au(100)-(1 x 1) and Au(111)-(1 x 1) have been used to understand the int ...

Royal Soc Chemistry2016

Surface Reaction Kinetics of Titanium Isopropoxide and Water in Atomic Layer Deposition

Patrik Willi Hoffmann, Yury Kuzminykh, Michael Oliver Reinke

In atomic layer deposition processes (ALD), surface reactions of adsorbed precursor species lead to the formation of thin films. In order to achieve a well-controlled, self-limiting process, the substrate is sequentially exposed to different precursor mole ...

American Chemical Society2016

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Understanding the surface kinetics of precursor decomposition during thin film formation represents a key aspect in the understanding and engineering of chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes. The determination of activ ...

American Chemical Society2015

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The combinatorial characterization of the growth kinetics in chemical vapor deposition processes is challenging because precise information about the local precursor flow is usually difficult to access. In consequence, combinatorial chemical vapor depositi ...

ACS Publications2015

Hydrothermal Synthesis of SrTiO

Andrea Testino, Agnese Carino, Paolo Nanni

The hydrothermal synthesis of SrTiO3 in a Sr(OH)2/NaOH solution by reaction of four different single crystalline titanium precursors (anatase, rutile, sodium titanate, and hydrogen titanate) having the same nanowire morphology was investigated under stagna ...

American Chemical Society2015

Development of Adsorbents for Selective Volatile Organic Compounds Removal from Diluted Gas Streams

Guillaume Bastien Baur

Contamination of the environment by anthropogenic volatile organic compounds (VOC) became of major concern during the last decades. Present in gas streams of many industrial exhausts, they are harmful and detrimental for both human health and environment e ...

EPFL2015

Complex trend of magnetic order in Fe clusters on 4d transition-metal surfaces. I. Experimental evidence and Monte Carlo simulations

Klaus Kern, Violetta Sessi

We demonstrate the occurrence of compensated spin configurations in Fe clusters and monolayers on Ru(0001) and Rh(111) by a combination of x-ray magnetic circular dichroism experiments, first-principles calculations, and Monte Carlo simulations. Our result ...

Amer Physical Soc2014

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