Concept

Electron beam physical vapor deposition

Publications associées (518)

Passivation of a CoCrMo PVD Alloy with Biomedical Composition under Simulated Physiological Conditions Studied by EQCM and XPS

Kinetics of passive film growth on a CoCrMo biomedical alloy have been studied using the Electrochemical Quartz Crystal Microbalance technique (EQCM) in phosphate buffer solution at room temperature and 37 degrees C. CoCrMo layers were deposited on the qua ...

2012

A New View of Microcrystalline Silicon: The Role of Plasma Processing in Achieving a Dense and Stable Absorber Material for Photovoltaic Applications

Christophe Ballif, Matthieu Despeisse, Grégory Bugnon, Thomas Söderström, Jakub Holovsky, Gaetano Parascandolo, Peter Cuony, Simon Hänni

To further lower production costs and increase conversion efficiency of thin-film silicon solar modules, challenges are the deposition of high-quality microcrystalline silicon (μc-Si:H) at an increased rate and on textured substrates that guarantee efficie ...

2012

CVD-grown TiO2 particles as light scattering structures in dye-sensitized solar cells

Ulf Anders Hagfeldt

Chem. vapor deposition (CVD) at atm. pressure, using TiCl4 as a precursor, was used to grow nanostructured TiO2 films on glass substrates. At relatively low temps. (∼245 °C) and using relatively high reactant concns., different nano-morphologies of TiO2 we ...

2012

Aluminum catalyzed growth of silicon nanowires: Al atom location and the influence of silicon precursor pressure on the morphology

Cyril Cayron, Vasiliki Tileli

We study the growth of silicon nanowires (SiNWs) by chemical vapor deposition (CVD) with aluminum as catalyst. We show that for a growth temperature of 600 °C, the silicon precursor partial pressure (SiH 4 in this study) is a key parameter for controlling ...

2012

Plasma deposition in an ideal showerhead reactor: a two-dimensional analytical solution

Christoph Hollenstein, Alan Howling, Boris Legradic, Michaël Chesaux

The interplay of gas flow and depletion by plasma dissociation determines the spatial distribution of species and the deposition uniformity in a plasma source. Many plasma reactors use a gas showerhead and the design of the flow dynamics is a critical aspe ...

2012

Laboratory-scale dam-break study of gravity currents with basal entrainment: PIV measurements of a viscous newtonian fluid over a horizontal bed of the same ﬂuid.

Christophe Ancey, Belinda Margaret Bates

Geophysical gravity flows such as avalanches and debris flows belong to a special class of hazardous environmental event, in which a mixture of solids and fluids (e.g. debris and mud, snow and air) flow as a liquid and may run out much further than expecte ...

2012

Biaxial texture development in aluminum nitride layers during off-axis sputter deposition

Paul Muralt

Polycrystalline aluminum nitride (AlN) layers were deposited by pulsed-dc reactive magnetron sputtering from a variable deposition angle alpha = 0 degrees-84 degrees in 5 mTorr pure N-2 at room temperature. X-ray diffraction pole figure analyses show that ...

American Vacuum Society2012

Microstructure and dielectric properties of piezoelectric magnetron sputtered w-ScxAl1-xN thin films

Paul Muralt, Ramin Matloub Aghdam

Piezoelectric wurtzite ScxAl1-xN (x = 0, 0.1, 0.2, 0.3) thin films were epitaxially grown by reactive magnetron co-sputtering from elemental Sc and Al targets. Al2O3(0001) wafers with TiN(111) seed and electrode layers were used as substrates. X-ray diffra ...

American Institute of Physics2012

Plasma Jet-Substrate Interaction in Low Pressure Plasma Spray-CVD Processes

Christoph Hollenstein, Philippe Frédérique Bruno Guittienne, Malko Gindrat

Conventional equipment for plasma spraying can be adapted for operation at low pressure so that PECVD-like processing can be performed. The plasma jet generated by the torch is characterized by a high convective velocity and a high gas temperature. The inf ...

Springer US2012

Electrical and optical properties of Ta-Si-N thin films deposited by reactive magnetron sputtering

Rosendo Sanjines, David Oezer

The electrical and optical properties of TaxSiyNz thin films deposited by reactive magnetron sputtering from individual Ta and Si targets were studied in order to investigate the effects of nitrogen and silicon contents on both properties and their correla ...

Amer Inst Physics2012

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