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The invention relates to a light phase modulator, which is based on a multi-gate transistor, sandwiching a Silicon-on-Insulator manowine used as an optical waveguide. ...
This paper presents a process for the co-fabrication of self-aligned NMOS and single electron transistors made by gated polysilicon wires. The realization of SET–MOS hybrid architectures is also reported. The proposed process exploits an original low energ ...
We study the electronic structure and the dielectric permittivity of ultrathin oxide layers on Si(I 00) substrates. By considering two different Si(l 00)-SiO2 interface models, we first show that the electronic structure in the interfacial oxide differs fr ...
In symmetric multilevel inverters, there is a tradeoff between the output quality and the reliability and efficiency of the converter. New asymmetric and hybrid solutions, using different voltages and devices in various parts of the inverter, promise signi ...
We report on the first ion-implanted dielectric electroactive polymer actuator that was successfully microfabricated and tested. Ion implantation is used to make the surface of the polymer locally conducting. Implanting the compliant electrodes solves the ...
We report an all-dry, two-step, surface nanoengineering method to fabricate nanomechanical elements without photolithography. It is based on the local deposition through a nanostencil of a well-defined aluminum pattern onto a silicon/silicon-nitride substr ...
A new method to release MEMS chips from a wafer without dicing is presented. It can be applied whenever SOI wafers are used that are structured from both the device and the handle side using DRIE. This method enables the release of extremely fragile struct ...
We investigate the dielectric permittivity of SiO2 on Si(100) substrates using a first-principles approach. It is shown that both the static and high-frequency dielectric constants of the oxide overlayer increase when the oxide thickness is reduced. This b ...
We present a lamellar grating interferometer realized with microelectromechanical system technology. It is used as a time-scanning Fourier-transform spectrometer. The motion is carried out by an electrostatic comb drive actuator fabricated by silicon micro ...
A semiconductor device such as a DRAM memory device is disclosed. A substrate 12 of semiconductor material is provided with energy band modifying means in the form of a box region 38 and is covered by an insulating layer 14. A semiconductor layer 16 has so ...