Recherche

Afficher tous les résultats pour

Accueil

Personne

Christoph Hollenstein

Publications associées (58)

À propos
Confidentialité
Mentions légales

Graph Chatbot

Powder formation in SiH[sub 4]–H[sub 2] discharge in large area capacitively coupled reactors: A study of the combined effect of interelectrode distance and pressure

Christoph Hollenstein, Benjamin Strahm

One of the main challenges for silicon thin film deposition for solar cell applications is to achieve high rate deposition in order to reduce the manufacturing costs. However, when silane and hydrogen are used as precursor gas in parallel plate plasma-enha ...

American Institute of Physics2010

Radio frequency breakdown between structured parallel plate electrodes with a millimetric gap in low pressure gases

Christoph Hollenstein, Alan Howling, Boris Legradic

This paper presents an investigation into radio frequency (rf) breakdown for electrodes with holes or protrusions, approximating the situation in real reactors and providing a benchmark for fluid simulations. rf breakdown curves (voltage versus pressure) g ...

American Institute of Physics2010

Study of the microstructure transition width from amorphous to microcrystalline silicon as a function of the input silane concentration

Christophe Ballif, Christoph Hollenstein, Grégory Bugnon, Andrea Feltrin, Benjamin Strahm

Amorphous and microcrystalline silicon have been proven to be very interesting for low cost thin film photovoltaic devices. Usually these two materials are deposited using the same large area plasma-enhanced chemical vapor deposition reactors from silane a ...

2009

Effects of a surface dielectric barrier discharge on transonic flows around an airfoil

Christoph Hollenstein, Peter Ott, Pénélope Leyland, Samantha Pavon

2009

Mechanisms of films and coatings formation from gaseous and liquid precursors with low pressure plasma spray equipment

Christoph Hollenstein, Malko Gindrat, Philippe Frédérique Bruno Guittienne

Plasma spraying is a well developed and widely used technology, successfully applied for ceramic and metal coatings in many fields of applications such as aeronautics, gas turbine, automotive or medical. The coatings obtained are usually intentionally poro ...

Elsevier2009

Non-intrusive plasma diagnostics for the deposition of large area thin film silicon

Christoph Hollenstein, Alan Howling, Benjamin Strahm

Plasma diagnostics for large area, industrial RF parallel-plate reactors can be useful for process optimization and monitoring, provided that their implementation is practical and non-intrusive. For instance, Fourier transform infrared (FTIR) absorption sp ...

Elsevier2009

Time- and spatially-resolved characterization of electrical discharge machining plasma

Christoph Hollenstein, Antoine Descoeudres, Ricardo Pérez Suárez

2008

Uniformity of silicon microcrystallinity in large area RF capacitive reactors

Christoph Hollenstein, Alan Howling, Benjamin Strahm

2008

Micro-plasma formation during opening of a low current electrical contact

Christoph Hollenstein

2008

Plasma silane concentration as a determining factor for the transition from amorphous to microcrystalline silicon in SiH4/H-2 discharges

Christoph Hollenstein, Alan Howling, Laurent Fabien Hubert Sansonnens, Benjamin Strahm

In this work, the microstructure transition from amorphous to microcrystalline silicon is defined in terms of the silane concentration in the plasma as opposed to the silane concentration in the input gas flow. In situ Fourier transform infrared absorption ...

2007

Page 3 sur 6

Radio frequency breakdown between structured parallel plate electrodes with a millimetric gap in low pressure gases

Christoph Hollenstein, Alan Howling, Boris Legradic

American Institute of Physics2010

Time- and spatially-resolved characterization of electrical discharge machining plasma

Christoph Hollenstein, Antoine Descoeudres, Ricardo Pérez Suárez

2008

Powder formation in SiH[sub 4]–H[sub 2] discharge in large area capacitively coupled reactors: A study of the combined effect of interelectrode distance and pressure

Christoph Hollenstein, Benjamin Strahm

American Institute of Physics2010

Study of the microstructure transition width from amorphous to microcrystalline silicon as a function of the input silane concentration

Christophe Ballif, Christoph Hollenstein, Grégory Bugnon, Andrea Feltrin, Benjamin Strahm

2009

Plasma silane concentration as a determining factor for the transition from amorphous to microcrystalline silicon in SiH4/H-2 discharges

Christoph Hollenstein, Alan Howling, Laurent Fabien Hubert Sansonnens, Benjamin Strahm

2007