Benjamin Strahm

Cette personne n’est plus à l’EPFL

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Publications associées (19)

Uniformity of silicon microcrystallinity in large area RF capacitive reactors

Christoph Hollenstein, Alan Howling, Benjamin Strahm

2008

Plasma silane concentration as a determining factor for the transition from amorphous to microcrystalline silicon in SiH4/H-2 discharges

Christoph Hollenstein, Alan Howling, Laurent Fabien Hubert Sansonnens, Benjamin Strahm

In this work, the microstructure transition from amorphous to microcrystalline silicon is defined in terms of the silane concentration in the plasma as opposed to the silane concentration in the input gas flow. In situ Fourier transform infrared absorption ...

2007

Optimization of microcrystaline silicon deposition efficiency

Christoph Hollenstein, Alan Howling, Laurent Fabien Hubert Sansonnens, Benjamin Strahm

2007

Investigations of radio-frequency, capacitively-coupled large area industrial reactor : cost-effective production of thin film microcrystalline silicon for solar cells

Benjamin Strahm

The constant energy consumption and world-wide demography expansion add to the potential risks of ecological and human disaster associated with global warming. This makes it a necessity to develop renewable energy technologies such as photovoltaic energy. ...

EPFL2007

Fast equilibration of silane/hydrogen plasmas in large area RF capacitive reactors monitored by optical emission spectroscopy

Christoph Hollenstein, Alan Howling, Laurent Fabien Hubert Sansonnens, Benjamin Strahm

The optimal plasma parameters for plasma processing, such as deposition of microcrystalline silicon from silane and hydrogen, are generally chosen in steady-state discharge conditions. However, this steady state must be reached in a short time after plasma ...

2007

Optimization of the microcrystalline silicon deposition efficiency

Christoph Hollenstein, Alan Howling, Laurent Fabien Hubert Sansonnens, Benjamin Strahm

Cost reduction constraints for microcrystalline silicon thin film photovoltaic solar cells require high deposition rates and high silane gas utilization efficiencies. If the requirements in deposition rate have sometimes been fulfilled, it is generally not ...

2007

Plasma diagnostics as a tool for process optimization

Christoph Hollenstein, Alan Howling, Benjamin Strahm

2007

Fast growth of microcrystalline silicon solar cells on LP-CVD ZnO in industrial KAI PECVD reactors

Christoph Hollenstein, Alan Howling, Laurent Fabien Hubert Sansonnens, Cédric Bucher, Benjamin Strahm

2006

Measurements and consequences of nonuniform radio frequency plasma potential due to surface asymmetry in large area radio frequency capacitive reactors

Christoph Hollenstein, Alan Howling, Laurent Fabien Hubert Sansonnens, Benjamin Strahm, Lukas Derendinger

In large area reactors, a local asymmetry of the electrode area, due to lateral grounded walls, causes a perturbation in rf plasma potential, due to the redistribution of lateral rf current, which propagates along the resistive plasma between capacitive sh ...

2005

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