Publications de Tristan Bret | EPFL Graph Search

Gas assisted focused electron beam induced etching of alumina

Patrik Willi Hoffmann, Tristan Bret, Bamdad Afra

This study investigates focused electron beam induced etching for the removal of alumina particles on patterned extreme ultra violet (EUV) mask using nitrosyl chloride (NOCl) as assist gas. As potential contaminant, particles of aluminum oxide (alumina, Al ...

2009

Beam-induced etching of material on substrate involves directing gaseous compound which reacts in the presence of beam to etch the excess material which not etching the substrate

Patrik Willi Hoffmann, Tristan Bret, Xavier Multone

A method and apparatus for local beam processing using a beam activated gas to etch material are described. Compounds are disclosed that are suitable for beam-induced etching. The invention is particularly suitable for electron beam induced etching of chro ...

FEI CO (FEIF-Non-standard)2005

Submicrometer Hall devices fabricated by focused electron-beam-induced deposition

Jürgen Brugger, Patrik Willi Hoffmann, Giovanni Boero, Niels Quack, Radivoje Popovic, Pavel Kejik, Schahrazede-Lila Mouaziz, Tristan Bret

Hall devices having an active area of about (500 nm)(2) are fabricated by focused electron-beam-induced deposition. The deposited material consists of cobalt nanoparticles in a carbonaceous matrix. The realized devices have, at room temperature, a current ...

American Institute of Physics2005

Submicrometer Hall devices fabricated by focused electron-beam-induced deposition

Jürgen Brugger, Patrik Willi Hoffmann, Giovanni Boero, Niels Quack, Radivoje Popovic, Pavel Kejik, Schahrazede-Lila Mouaziz, Tristan Bret

Hall devices having an active area of about (500 nm)2 are fabricated by focused electron-beam-induced deposition. The deposited material consists of cobalt nanoparticles in a carbonaceous matrix. The realized devices have, at room temperature, a current se ...

2005

Physico-chemical study of the focused electron beam induced deposition process

Tristan Bret

The focused electron beam induced deposition process is a promising technique for nano and micro patterning. Electrons can be focused in sub-angström dimensions, which allows atomic-scale resolution imaging, analysis, and processing techniques. Before the ...

EPFL2005