Publications de Yury Kuzminykh

Surface Reaction Kinetics of Titanium Isopropoxide and Water in Atomic Layer Deposition

Patrik Willi Hoffmann, Yury Kuzminykh, Michael Oliver Reinke

In atomic layer deposition processes (ALD), surface reactions of adsorbed precursor species lead to the formation of thin films. In order to achieve a well-controlled, self-limiting process, the substrate is sequentially exposed to different precursor mole ...

American Chemical Society2016

Combinatorial HV-CVD survey of barium triisopropyl cyclopentadienyl and titanium tetraisopropoxide for the deposition of BaTiO3

Patrik Willi Hoffmann, Yury Kuzminykh, Michael Oliver Reinke

Barium titanate is a very promising material for the integration of optical communication into electronic integrated circuits. For a successful integration into CMOS compatible technology, a growth process has to be found which allows forming crystalline B ...

Wiley-VCH Verlag2015

Low Temperature Chemical Vapor Deposition Using Atomic Layer Deposition Chemistry

Patrik Willi Hoffmann, Yury Kuzminykh, Michael Oliver Reinke

Chemical vapor deposition (CVD) techniques rely on high temperatures to activate the chemical decomposition of precursors on the substrate surface. Lower temperatures are applied in atomic layer deposition (ALD), where deliberate pyrolysis of the precursor ...

American Chemical Society2015

Selective Growth of Titanium Dioxide by Low-Temperature Chemical Vapor Deposition

Patrik Willi Hoffmann, Yury Kuzminykh, Michael Oliver Reinke

A key factor in engineering integrated optical devices such as electro-optic switches or waveguides is the patterning of thin films into specific geometries. In particular for functional oxides, etching processes are usually developed to a much lower exten ...

Amer Chemical Soc2015

Limitations of patterning thin films by shadow mask high vacuum chemical vapor deposition

Patrik Willi Hoffmann, Yury Kuzminykh, Michael Oliver Reinke

A key factor in engineering integrated devices such as electro-optic switches or waveguides is the patterning of high quality crystalline thin films into specific geometries. In this contribution high vacuum chemical vapor deposition (HV-CVD) was employed ...

Elsevier2014

Evaluation of niobium dimethylamino-ethoxide for chemical vapour deposition of niobium oxide thin films

Patrik Willi Hoffmann, Ali Dabirian, Yury Kuzminykh, Estelle Wagner, Giacomo Benvenuti

Chemical vapour deposition (CVD) processes depend on the availability of suitable precursors. Precursors that deliver a stable vapour pressure are favourable in classical CVD processes, as they ensure process reproducibility. In high vacuum CVD (HV-CVD) pr ...

Elsevier2014

Precursor adsorption efficiency of titanium tetra isopropoxide in the presence of a barium beta-diketonate precursor

Patrik Willi Hoffmann, Yury Kuzminykh, Michael Oliver Reinke

Barium titanate is a promising candidate for integrated photonic application due to its high electro-optic coefficient; therefore the need arises for a suitable deposition technique which provides high film quality at low temperatures (below 500 degrees C) ...

Elsevier Science Sa2013

High vacuum chemical vapour deposition of oxides: A review of technique development and precursor selection

Patrik Willi Hoffmann, Ali Dabirian, Yury Kuzminykh, Michael Oliver Reinke

Thin films of oxide materials are widely used for various types of applications. The selection of an appropriate deposition method depends on the aimed material and application. We review here a high vacuum chemical vapour deposition (HV-CVD) method, which ...

Elsevier2013

Chemical Vapor Deposition Kinetics and Localized Growth Regimes in Combinatorial Experiments

Patrik Willi Hoffmann, Ali Dabirian, Yury Kuzminykh, Estelle Wagner, Giacomo Benvenuti

Laser-assisted deposition: The discovery of chemical vapor deposition (CVD) conditions under which the growth rate is a decreasing function of the precursor flux has the potential to boost the resolution of laser-assisted CVD processes whereas flux- and de ...

2011

Combinatorial Discovery and Optimization of Amorphous HfO2-Nb2O5 Mixture with Improved Transparency

Paul Muralt, Patrik Willi Hoffmann, Silviu Cosmin Sandu, Ali Dabirian, Yury Kuzminykh, Scott Harada, Estelle Wagner, Giacomo Benvenuti, Bamdad Afra

Combinatorial high vacuum chemical vapor deposition (HV-CVD) of mixed HfO2-Nb2O5 thin films has been demonstrated to yield amorphous layers at substrate temperatures where individually deposited pure HfO2 and Nb2O5 films are polycrystalline. Spectroscopic ...

Electrochemical Society2010