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Stencil lithography (SL) is a shadow mask based technique which allows parallel, resistless, micro- and nano-patterning of material through apertures in a membrane (stencil) onto a substrate [1]. The stencils are usually made of LPCVD low-stress SiN due to ...
We demonstrate the nanofabrication of the transmission SU-8 gratings with periods from 200 nm (5000 lines/mm) to 1 lm (1000 lines/mm) with different trench depths for applications from near-infrared to deep-UV wavelength. The imprint property of SU-8 under ...
We present two kinds of novel nanoimprint lithography techniques based on SU-8 photoresist with single layer and tri-layer approaches. The imprint templates with high aspect ratio were first fabricated by electron beam lithography (EBL) and reactive ion et ...
We present the fabrication of 150 nm half-pitch Si grating templates by reactive ion etch (RIE), which are used in nanoimprint lithography (NIL) for high groove density gratings in SU-8 plastic. The etch properties such as the etch rate, profile and etchin ...
We present a photonic meta-material with planar dielectric chiral structures on SU-8 realized using nanoimprint lithography (NIL). A Si template with chiral structure arrays was first fabricated by electron beam lithography (EBL) followed by reactive ion e ...
We report a novel nanoprocess to fabricate 2D metallic and non-metallic nanophotonic crystals on SU-8 using hot embossing combining with a UV-curing process. The fabricated photonic crystals were characterized by optical diffraction experiments. Theoretica ...
