Publications de Cédric Bucher

Pizza Oven Processing of Organohalide Perovskites (POPOP): A Simple, Versatile and Efficient Vapor Deposition Method

Christophe Ballif, Cédric Bucher, Christian Michael Wolff, Austin George Kuba, Deniz Türkay, Kerem Artuk, Quentin Jean-Marie Armand Guesnay

Hybrid vapor deposition is one of the most appealing processes for perovskite photovoltaics fabrication, thanks to its versatile nature. By using sequentially different vapor deposition processes tailored to the inorganic and organic perovskite precursors' ...

Wiley-V C H Verlag Gmbh2024

Vapor Transport Deposition of Methylammonium Iodide for Perovskite Solar Cells

Christophe Ballif, Quentin Thomas Jeangros, Florent Sahli, Cédric Bucher, Björn Niesen, Léo Duchêne, Quentin Jean-Marie Armand Guesnay, Aymeric Michel Schafflützel, Nathanaël Miaz, Niccolo Salsi

Vapor-based processes are promising options to deposit metal halide perovskite solar cells in an industrial environment due to their ability to deposit uniform layers over large areas in a controlled environment without resorting to the use of (possibly to ...

2021

Fast growth of microcrystalline silicon solar cells on LP-CVD ZnO in industrial KAI PECVD reactors

Christoph Hollenstein, Alan Howling, Laurent Fabien Hubert Sansonnens, Cédric Bucher, Benjamin Strahm

2006

High Efficiency p-i-n a-Si:H Solar Cells with Low Boron Cross-Contamination Prepared in a Large Area Single-Chamber PECVD Reactor

Christoph Hollenstein, Alan Howling, Arvind Shah, Juliette Ballutaud, Cédric Bucher, Stefano Benagli

In this work, a new type of short water vapor treatment of the interface between the p- and i-layer is presented. This novel treatment is performed under vacuum below 1 mbar for 5 min and considerably reduces the i-layer boron contamination in amorphous si ...

2004

Role of i layer deposition parameters on the V0c and FF of an a-Si:H solar cell deposited by PECVD at 27.13 MHz

Arvind Shah, Juliette Ballutaud, Cédric Bucher, Stefano Benagli

A study of the i-layer porosity as a function of the deposition parameters by PECVD technique, is presented here. It is demonstrated in particular, that for a fixed deposition rate of 2 Å/s, increasing the plasma power tends to increase the layer density, ...

2003