Publications de Akshath Raghu Shetty

Impact of the Oxygen Content on the Optoelectronic Properties of the Indium-Tin-Oxide Based Transparent Electrodes for Silicon Heterojunction Solar Cells

Christophe Ballif, Mathieu Gérard Boccard, Jan Haschke, Jean Cattin, Brahim Aissa, Akshath Raghu Shetty

Amorphous/crystalline silicon heterojunction (SHJ) solar cells technology is attracting tremendous attention in recent years due to its potential to achieve high power conversion efficiencies at low fabrication temperatures and using few process steps. How ...

AMER INST PHYSICS2019

Impact of the Oxygen Flow during the Magnetron Sputtering Deposition on the Indium Tin Oxide thin films for Silicon Heterojunction Solar Cell

Christophe Ballif, Mathieu Gérard Boccard, Jan Haschke, Jean Cattin, Brahim Aissa, Akshath Raghu Shetty

We report on the optoelectronic properties of ITO layers deposited by DC sputtering, using different oxygen to total flow ratios [r(O-2) = O-2/Ar, ranging from 1% to 8%], for silicon heterojunction (SHJ) solar cell application. The depth profiling of the v ...

IEEE2019

Formation of (113) texture in fcc nitride thin films and its influence on the film properties

Ayat Karimi, Alireza Karimi, Akshath Raghu Shetty

This work presents a study of XRD measurements on the development of the (113) preferential orientation with film thickness for Ti0.67Al0.33N films grown on Si(100) substrates by pulsed DC magnetron sputtering. The buildup of (113) texture was observed usi ...

Elsevier Science Sa2013

Texture mechanisms and microstructure of biaxial thin films grown by oblique angle deposition

Ayat Karimi, Alireza Karimi, Akshath Raghu Shetty

In order to understand the texture formation mechanism in thin films grown under oblique angle deposition (OAD), TiAlN films were deposited at room temperature (RT) under various incident angles. We show that both in-plane and out-of-plane crystallographic ...

Wiley-V C H Verlag Gmbh2012

Off-Axis Texture and Crystallographic Accommodation in Multicomponent Nitride Thin Films Deposited by Pulsed Magnetron Sputtering

Akshath Raghu Shetty

The study of texture in thin films is one of the possibilities to obtain information on the fundamental physical processes which govern the thin film growth. Near the substrate, the crystalline orientation of the coating layer will usually be influenced by ...

EPFL2012

Effect of deposition angle on the structure and properties of pulsed-DC magnetron sputtered TiAlN thin films

Marco Cantoni, Alireza Karimi, Akshath Raghu Shetty

This article reports the comparison of structure and properties of titanium aluminum nitride (TiAlN) films deposited onto Si(100) substrates under normal and oblique angle depositions using pulsed-DC magnetron sputtering. The substrate temperature was set ...

2011

Texture change through film thickness and off-axis accommodation of (002) planes

Ayat Karimi, Alireza Karimi, Akshath Raghu Shetty

We present our recent experimental results on the formation of off-axis texture and crystallographic tilting of crystallites that take place in thin film of transition metal nitrides. For this purpose, the microstructural development of TiAlN film was stud ...

2011