Reusability of nanostencils for the patterning of Aluminum nanostructures by selective wet etching
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We present nanostencil lithography as a new and parallel nanopatterning technique for batch fabrication of micro/ nanoelectromechanical systems (MEMS/NEMS) with high throughput and resolution. We use nanostencil lithography for the purpose of integrating n ...
One of the major advantages of stencil lithography is the possibility to use stencils many times. However, when stencils contain nanoapertures, the clogging of the membranes limits the useful life time of the stencils. The clogging is due to the accumulati ...
Gold nanoparticles with hydrophobic surface have been deposited on a silicon substrate chemically patterned by reactive ion etching through a stencil mask and chemical vapour deposition of alkyl silanes. After deposition by dipping and adequate rinsing, th ...
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