Growth and Optical Characterization of Dense Arrays of Site-Controlled Quantum Dots Grown in Inverted Pyramids
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The technology and optical properties of site-controlled quantum wires and quantum dots integrated with photonic crystal membrane cavities are presented. Applications in lasers and single photon devices and circuits are discussed. ...
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We propose a novel lithography method based on local deposition through miniature shadow-masks (nanostencils) for the fabrication of silicon based nanoelectronics devices. The method allows patterning of sub 100nm scale metal structures in a reproducible w ...
Stencil lithography is a surface patterning technique that relies on the local physical vapor deposition of material through miniaturized shadow mask membranes. It is extremely useful for the formation of patterns, mainly thin structured metal films, in si ...
Nanostencil lithography is a flexible, rapid and resistless patterning method based on a high-resolution shadow mask. It allows for a wide choice of materials and surfaces to be structured and on the contrary to deep-ultraviolet (DUV), x-ray, electron beam ...
Cantilever-based detection of ultrasmall forces is of great interest for several applications such as magnetic resonance force miscroscopy (MRFM) where an ultrahigh sensitive cantilever is used to detect magnetic resonance in small ensembles of electron or ...
We present two kinds of novel nanoimprint lithography techniques based on SU-8 photoresist with single layer and tri-layer approaches. The imprint templates with high aspect ratio were first fabricated by electron beam lithography (EBL) and reactive ion et ...
The endeavour to develop nanodevices demands for patterning methods in the nanometer scale. The continuous improvement in lithography methods based on deep UV (DUV), X-ray, or electron beam exposure allow for further progress in integrated circuit hardware ...
In this paper, the design and the characterization of batch fabricated SixNy micropipette arrays with diameters ranging from 6 νm down to 250 nm are described. The process used to fabricate the micromachined pipettes includes a deep reactive ion etching st ...
We report the fabrication of solenoidal microcoils with hollow core embedded within two 100 µm thick borosilicate glass wafers. The main process steps are the reactive ion etching of borosilicate glass, anodic wafer bonding, copper metal organic chemical v ...
A high-resolution negative Calixarene resist has been used to pattern 2-nm-thick Ti O2 films on 50-nm-thick Pt layers by electron beam lithography, in order to carry out site controlled growth of Pb (Zr,Ti) O3 structures. Single dot structures have been wr ...