Fluoropolymer coating of medical grade poly(vinyl chloride) by plasma-enhanced chemical vapor deposition techniques
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Light Induced Chemical Vapour Deposition (LICVD) of titanium dioxide thin films is studied in this work. It is shown that this technique enables to deposit locally and selectively a chosen crystalline phase with a precise controlled thickness at low substr ...
A simple one-dimensional model for plasma deposition in a rectangular showerhead reactor with single side pumping has been developed in order to explain the mechanisms which yield uniform deposition using this gas flow configuration. Although the flow velo ...
The invention relates to an effusing source for film deposition made of a reservoir comprising one hole characterized by the fact that the hole diameter is less than one order of magnitude than the mean free path of the molecules determined by the pressure ...
ECOLE POLYTECHNIQUE FEDERALE LAUSANNE (ECOL-Non-standard) BENVENUTI G (BENV-Individual) AMOROSI S (AMOR-Individual) HALARY-WAGNER E (HALA-Individual)2002
The influence of the surface morphology of semicrystalline polyamide 12 PA12! on the adhesion of thin silicon oxide coatings is analyzed by means of uniaxial fragmentation tests and scanning local-acceleration microscopy SLAM!. Two types of PA12 substrates ...
There is a need for chemically resistant coatings that protect the exposed surface of microfluidics components. Pinhole free films with low stress and a good uniformity on flat and inclined surfaces are required. In this study, amorphous silicon carbide (S ...
2000
The deposition of enzymes using electrochemically aided adsorption in the presence of glutaraldehyde allows spatially well controlled protein layers to be formed. By adjusting the deposition parameters (i.e. current, pulse, duration and amplitude) this tec ...
Single crystals of layered semiconductors such as WS2 and MoS2 have already proven their efficiency as active elements in photovoltaic cells. Due to their high optical absorption coefficient in the visible range, these materials could be used in the form o ...
A combined PVD/PECVD process for the vacuum deposition of titaniumcontainingamorphoushydrogenatedcarbonfilms is described. Elemental compositions of the deposited films have been determined by in situ core level photoelectron spectroscopy (XPS). The long-t ...
Highly textured PZT(111), PZT(001/100) and random PZT films have been grown on Pt and RuO2 bottom electrodes by means of an in-situ, multimagnetron reactive sputtering process with three metal targets (Pb, Zr, Ti). The orientation was varied with the botto ...
1999
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Particle contamination formed in reactive plasmas imposes an upper limit on the rate for particle-free deposition. Conversely, these plasmas could be exploited to produce nanometric clusters and particles for various applications. Infrared absorption spect ...
Mat. Res. Soc. Symp. Proc. Vol. 507, Materials Research Society1998
