Influence of the substrate geometrical parameters on microcrystalline silicon growth for thin-film solar cells

The effect of substrate morphology on the growth and electrical properties of single-junction microcrystalline silicon cells is investigated. A large variety of V-shaped and U-shaped substrates are characterized by scanning electron microscopy (SEM) and the growth of thin-film microcrystalline silicon (mc-Si:H) devices is observed by cross-sectional transmission electron microscopy (TEM). It is shown that enhanced electrical properties of solar cells are obtained when U-shaped substrates are used and the effect is universal, i.e. independent of the substrate or feature size. U-shaped substrates prevent the formation of two dimensional ‘‘cracks’’, which are identified as zones of porous material, from propagating throughout the active part of the solar cell. A numerical growth simulation program reproduces satisfactorily these experimental observations. According to these simulations, shadowing effect due to surface morphology and low adatom surface diffusion length are responsible for the formation of cracks in mc-Si:H material.

Exploring co-sputtering of ZnO:Al and SiO2 for efficient electron-selective contacts on silicon solar cells

Christophe Ballif, Mathieu Gérard Boccard, Quentin Thomas Jeangros, Monica Morales Masis, Weiliang Wu, Sihua Zhong

In recent years, considerable efforts have been devoted to developing novel electron-selective materials for crystalline Si(c-Si) solar cells with the attempts to simplify the fabrication process and improve efficiency. In this study, ZnO:Al (AZO) is co-sputtered with SiO2 to form AZO:SiO2 films with different SiO2 content. These nanometer-scale films, deposited on top of thin intrinsic hydrogenated amorphous silicon films and capped with low-work-function metal (such as Al and Mg), are demonstrated to function effectively as electron-selective contacts in c-Si solar cells. On the one hand, AZO:SiO2 plays an important role in such electron-selective contact and its thickness is a critical parameter, with a thickness of 2 nm showing the best performance. On the other hand, at the optimal thickness of AZO:SiO2, the open circuit voltage (V-OC) of the solar cells is found to be relatively insensitive to material properties of AZO:SiO2. Whereas, regarding the fill factor (FF), AZO without SiO2 content exhibits to be the optimal choice. By using AZO/Al as electron-selective contact, we successfully realize a 19.5%-efficient solar cell with V-OC over 700 mV and FF around 75%, which is the best result among c-Si solar cells using ZnO as electron-selective contact. Also, this work implies that efficient carrier-selective film can be made by magnetron sputtering method.

ELSEVIER SCIENCE BV2019

TEM characterization of textured silicon heterojunction solar cells

Christophe Ballif, Aïcha Hessler-Wyser, Christian Monachon

Increasing the efficiency of crystalline silicon (c-Si) solar cells requires the reduction of both bulk and interface recombination. Even if bulk recombination is almost suppressed, the symmetry of the crystal lattice is disturbed at the surface and hence, due in particular to non-saturated bonds (dangling bonds), a large density of defects exists. Thus, in this case, the free-carrier lifetimes are no longer limited by the quality of the bulk c-Si, but by its surface. To keep the recombination losses at the c-Si surface at minimal levels, the surface must be electronically well passivated. An efficient way to obtain passivation is to use low temperature grown (typically 200°C) hydrogenated amorphous silicon (a-Si:H) [1]. In the case of photovoltaic applications, the passivation of both c-Si wafer surfaces (i.e., the emitter and the rear surface) is of crucial importance for good performances. In this work, the 3-7 nm a-Si:H based passivation layers of the device are grown by VHF-PECVD in a single chamber. The solar cells consist of a multilayered structure: Al back contact / DC-sputtered ITO (Indium Tin Oxyde) / n/i a-Si:H back surface field (BSF) / n-type c-Si substrate with a resistivity of 1-3 Ωcm / intrinsic a-Si:H / i/p a-Si:H emitter / and a front contact made out of DC-sputtered ITO via a shadow mask to define the cells (diameter = 4.5 mm). Such devices are called heterojunction (HJ) silicon solar cells. Surface recombination losses are a major concern for all c-Si solar cells. In particular, mastering of HJ emitter and back surface field formation on textured c-Si is crucial for high-performance HJ solar cells. High Resolution Transmission Electron Microscopy (HRTEM) is necessary to identify the key microstructural features of the a-Si:H/c-Si interface, and TEM micrographs of HJ interfaces on flat and textured high-performance devices are shown for the first time and discussed with respect to the resulting solar cell electrical performances. TEM micrographs of our flat high-efficiency HJs show abrupt c-Si/a-Si:H/μc-Si:H interfaces for emitter and BSF formation. Whereas on the pyramidal facets of the textured substrate the growth is identical to the flat substrate interface, we observed unexpected epitaxial growth at the bottom of the pyramid valleys. We have identified these local epitaxial domains as an efficient surface recombination path, and by consequence, as responsible for the observed decreased VOC on textured HJ cells. When minimizing the density of epitaxial domains at the c-Si/a-Si:H interface by adapting the deposition conditions, a solar cell VOC of 660 mV is obtained. An additional modification of the textured c-Si surface morphology leads to VOCs as high as 700 mV.

Springer2008

Window layer with p doped silicon oxide for high V-oc thin-film silicon n-i-p solar cells

Christophe Ballif, Rémi Biron, Jordi Escarre Palou, Franz-Josef Haug, Céline Pahud

We investigate the influence of the oxygen content in boron-doped nanocrystalline silicon oxide films (p-nc-SiOx) and introduce this material as window layer in n-i-p solar cells. The dependence of both, optical and electrical properties on the oxygen content is consistent with a bi-phase model which describes the p-nc-SiOx material as a mixture of an oxygen-rich (O-rich) phase and a silicon-rich (Si-rich) phase. We observe that increasing the oxygen content enhances the optical gap E-04 while deteriorating the activation energy and the planar conductivity. These trends are ascribed to a higher volume fraction of the O-rich phase. Incorporated into n-i-p a-Si: H cells, p-nc-SiOx layers with moderate oxygen content yield open circuit voltage (V-oc) up to 945mV, which corresponds to a relative gain of 11% compared to an oxygen-free p-layer. As a similar gain is obtained on planar and on textured substrates, we attribute the increase in V-oc to the higher work function of the p-nc-SiOx layer made possible by its wider band gap. These results are attained without changing the dilution ratio of the 250 nm thick intrinsic layer. We also observe an enhancement of 0.6mA cm(-2) in short circuit current density in the short wavelengths due to the higher transparency of the p-nc-SiOx layer. Finally, an initial efficiency of 9.9% for a single junction 250 nm a-Si:H n-i-p solar cell on plastic foil is achieved with the optimization of the p layer thickness, the doping ratio of the front transparent conductive oxide, and the optical properties of the back reflector. (C) 2011 American Institute of Physics. [doi:10.1063/1.3669389]

American Institute of Physics2011

TEM characterization of textured silicon heterojunction solar cells

Christophe Ballif, Aïcha Hessler-Wyser, Christian Monachon

Springer2008